Used AMAT / APPLIED MATERIALS P5000 #9400379 for sale

AMAT or AMAT / APPLIED MATERIALS P5000 is a type of chemical vapor deposition (CVD) reactor used for thin film deposition, consisting of a heated chamber, with a quartz window and showerhead assembly. The CVD process in this equipment generates a chemical reaction between two gaseous chemicals, which create a thin film over the substrate. AMAT P-5000 is designed for high throughput and productivity in an automated, user-friendly system, making it an ideal choice for production use. The reactor is powered by a turbo-pumped unit, which provides a versatile combination of low pressure, high pumping speeds, and high gas flows. This enables higher deposition rates and improved yield for a variety of thin film applications. The reactor consists of a main vacuum chamber, a quartz window, and a heater box. The vacuum chamber is constructed out of stainless steel, with several forms of insulation around the chamber walls. The walls are attached to each other using hermetically sealed welds to reduce heat loss and to ensure a good seal from the environment. The chamber is equipped with a turbo pump machine that works to maintain low pressure in the chamber and create the optimal environment for thin-film deposition. The quartz window on the reactor is designed to enable a consistent inlet of gas and to enable an even temperature across the substrate surface. The quartz window is also used to protect the substrates from temperature and particle contaminants, keeping the substrate surface clean and free of contamination. The heater box is used to maintain the consistent temperature inside the chamber. The temperature is regulated either manually or through a computer control module. The heater is usually comprised of two elements, one of which is a heating element and the other is a grid of sensors. In addition, APPLIED MATERIALS P 5000 includes a showerhead arm for easily holding the substrate in place during thin film deposition. The showerhead is used to ensure an even distribution of the gaseous chemicals onto the substrate. It also improves the uniformity of the thin films by evenly distributing the gas flow into even circular patterns onto the substrate. All of these components combine to create APPLIED MATERIALS P5000, a revolutionary reactor for thin film deposition. The tool provides users with a reliable and automated platform for achieving high deposition throughput for both large and small substrates. Its versatile design also makes it a good choice for both production and research environments. With AMAT P5000, APPLIED MATERIALS is setting the standard for the next generation of thin film deposition systems.