Used AMAT / APPLIED MATERIALS P5000 #9402168 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is an advanced, high-throughput production tool designed for semiconductor device fabrication. It offers a low-cost platform for the manufacture of silicon-based and other semiconductor devices. AMAT P-5000 is a single-wafer thermal equipment that utilizes many new, novel technologies to provide superior uniformity, throughput, and reliability. APPLIED MATERIALS P 5000 is primarily utilized to deposit and pattern films on wafers in the form of a lithographic "mask". This mask often contains features such as feature shapes, circuit lines, and other functions such as contact pads, vias, and interconnects. This mask is created in order to produce features on the wafer that can then be used to create or reinforce electrical connections or form desired patterns. The P5000Reactor's design includes an automated nitrogen/argon purge capability, intelligent control system and premier process recipe development software. All of these functions are aimed at providing superior uniformity, throughput and reliability for AMAT / APPLIED MATERIALS P-5000. The automated nitrogen/argon purge capability reduces particle contamination, providing excellent control over film stoichiometry and film uniformity. The intelligent control unit optimizes the process conditions for each of the available process recipes. The integrated recipe development software provides proven, optimized recipes for fast set-up of new tasks, enabling customers to maximize factory output. APPLIED MATERIALS P-5000 also provides unprecedented temperature uniformity in the deposition chamber. The three-zone temperature control machine allows for even temperature distributions on the wafer, allowing for improved process control and wafer quality. Additionally, AMAT P 5000 features excellent throughput, with the capability of processing up to 80 wafers per hour. Overall, AMAT P5000 is an advanced reactor specifically designed for semiconductor device fabrication. It is equipped with a range of features that enable superior uniformity, throughput, and reliability, furthering the trend of increasing efficiency and productivity in the fabrication processes of semiconductor devices.