Used AMAT / APPLIED MATERIALS P5000 #9402494 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a versatile, reliable and advanced reactor used in a variety of industrial processes. AMAT P-5000 is designed for use in semiconductor device manufacturing, nanotechnology, and other advanced materials applications. It is an advanced "Aerobic" type 850mm Vacuum Chamber reactor (shortened: Aer-850M). APPLIED MATERIALS P 5000 is a single wafer process with advanced PVD and Complex Thin-Film technologies. It delivers a process based on unique dimensions and parameters for advanced metal compounds, which are the key to ultra-high-performance applications. The chamber volume of P5000 is 650 liters and its process gas flow is up to 800SLM. It provides thermal management of up to 800C, enabling the user to process from high to low temperatures with high consistency, repeatability and flexibility. APPLIED MATERIALS P-5000 also allows for the control of various atmosphere options such as O2, N2, H2 and Ar, as well as several reactants. Furthermore, it provides multiple advanced temperature-programmable features, delivering the perfect temperature profile for a wide range of materials and deposition steps. APPLIED MATERIALS P5000 has a high-throughput design, an open-frame fan configuration and an integrated automation system that takes full advantage of its flexibility as a process tool. Its modular design makes it possible to replace and upgrade a number of components and features, including the control system and the cooling system. This allows users to tailor the device to meet their own requirements. In addition, AMAT / APPLIED MATERIALS P-5000 is designed with a few additional features that make it a great choice for advanced materials applications. For starters, it has a small and compact footprint, which helps the user save on floor space. Moreover, P-5000 has a four-dot wafer alignment design that reduces source contamination and improves process uniformity. Additionally, it has an intuitive touchscreen interface for easy control and monitoring of all process parameters. All these features make AMAT P5000 an advanced, reliable and flexible reactor for creating advanced materials. It is ideal for applications such as high-performance films, dielectric, semiconductor and nanotechnology. AMAT / APPLIED MATERIALS P 5000's ability to control both high and low temperature processes, provides precise and repeatable processing which results in the highest quality end materials.