Used AMAT / APPLIED MATERIALS P5000 #9407851 for sale

AMAT / APPLIED MATERIALS P5000 plasma etch reactor is a highly advanced atmospheric pressure etching equipment designed for semiconductor device fabrication. This reactor features a wide range of process capabilities, including precision etching, high resolution patterning and precise doping of small, intricate substrate structures. AMAT P-5000 is capable of performing deep etching and anisotropic etching as well as insulation patterning and precise doping, making it an ideal tool for a variety of high-performance electronic applications, such as ULSI circuits and compound semiconductor devices. APPLIED MATERIALS P 5000 utilizes an electron cyclotron resonance (ECR) microwave plasma source in order to source radicals and ions in order to effectively etch and dope semiconductor materials. This ECR source operates at 13.56 MHz, providing APPLIED MATERIALS P5000 with a very stable and precise plasma environment. Because of this, P 5000 is capable of etching high aspect ratio features, useful for making small features for high resolution devices. In addition, P5000 also features high etch selectivity, meaning that different materials can be selectively etched without damaging the underlying layers. P-5000 features a user-friendly, menu-driven operation system that allows for quick and easy operation. It also features automatic tuning, making operation even easier and allowing users to quickly change between different etching recipes and process steps. Additionally, AMAT / APPLIED MATERIALS P 5000 is equipped with an onboard computer control unit, allowing it to be interconnected to other equipment of the same type. This computer control machine also enables the user to precisely control the process parameters, ensuring more consistent results. AMAT P5000 is capable of handling substrates with a wide range of dimensions. It is compatible with substrates up to 8" in diameter, making it suitable for production-level etching of high resolution substrates. The tool is enclosed in a temperature and humidity controlled environment, ensuring temperature and gas stability during the process. Overall, AMAT P 5000 is an advanced plasma etching asset, capable of performing accurate, precise etching and doping of semiconductor materials. With its wide range of process capabilities and user-friendly operation model, APPLIED MATERIALS P-5000 provides a reliable and efficient means of etching high resolution circuits and devices.