Used AMAT / APPLIED MATERIALS P5000 #9408602 for sale

AMAT / APPLIED MATERIALS P5000 is a high-end PECVD reactor designed for advanced semiconductor device fabrication. The equipment utilizes a highly reliable, compact and modular architecture to deliver optimal system performance. AMAT P-5000 features a SiH2Cl2 atmospheric-pressure CVD process chamber with an extended showerhead to ensure uniformity across the entire wafer surface and drive greater precision, repeatability and throughput. Dual pulsed plasma sources integrated into the process chamber provide rapid wafer surface activation and with a modular architecture and robust hardware components, ensure long term compatibility and reliability. APPLIED MATERIALS P 5000's automated wafer loading, handling and robotic arm unit provides an exceptionally low cycle time while maintaining maximum precision and repeatability. It has the capability to process all types of substrates such as silicon, nitride and aluminium, allowing for application flexibility and adaptability to various process challenges. The machine integrates advanced analytical tools such as DVD and SEM analysis, as well as recipe automation and simulation technology to drive process improvement. P 5000 also supports full integration with existing fabrication environment for efficient control and data transfer. AMAT / APPLIED MATERIALS P-5000 has been designed to provide superior performance and yield in semiconductor processing. It provides high reliability, uniformity and precision, along with exceptional throughput and controllability, making it a preferred choice for advanced semiconductor device fabrication.