Used AMAT / APPLIED MATERIALS P5000 #9408603 for sale

AMAT / APPLIED MATERIALS P5000 is a horizontal, dual wafer, parallel plate Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor. It is designed to provide reliable processing of high-quality thin films used in semiconductor manufacturing applications. AMAT P-5000 is a PECVD chamber that utilizes the advantage of dual wafer-rf plasma chemistry to provide superior film provision through higher deposition rates and superior layer uniformity. It is a high-performance tool capable of growing various films including dielectric, etch, and barrier films. APPLIED MATERIALS P 5000 has a large area parallel plate design which enables unrestricted wafer access and has a large operating window for thin films of all sizes. The innovative plasma shield design also eliminates the need for mechanical shunt protection. The reactor is equipped with a single load lock that allows for easy transfer of wafers from storage or other tools to APPLIED MATERIALS P5000. The load lock, chamber, and substrate holders are all integrated into the reactor, thus allowing for a more uniform and reliable process. The wafer holders are designed to minimize the number of process cycles for the chamber and provide an even plasma distribution across the chamber. APPLIED MATERIALS P-5000 is equipped with a powerful RF generator that produces up to 5000 watts of RF energy. This RF energy is used to create a plasma which activates the gas precursors in order to produce high-density films on wafers. The reactor also comes with a series of process recipes and various controllers that provide a consistent and repeatable plasma deposition process. AMAT / APPLIED MATERIALS P-5000 is small and compact, making it easy to install and operate. It is also equipped with several alarm and process monitoring systems that help to ensure that the process runs correctly and to avoid unexpected malfunctions. AMAT P5000 is ideal for high-quality and high-accuracy thin films, providing excellent film uniformity and improved yield. It has a high throughput that allows for short processing times and is also capable of handling high-temperature processes. The design and features of AMAT P 5000 make it an ideal tool for semiconductor manufacturers in need of high-performance thin films.