Used AMAT / APPLIED MATERIALS P5000 #9409373 for sale

AMAT / APPLIED MATERIALS P5000 High Aspect Ratio Etch Equipment is a reliable and versatile reactor ideally suited for wafer etching applications requiring high aspect ratio (HAR) etching. This multi-purpose system can be used for a range of applications such as oxide and poly-silicon etching. It is capable of wet and dry etching in an RIE (Reactive Ion Etching) or ICP (Inductively Coupled Plasma) etch process. AMAT P-5000 features an easy to use, intuitive user interface with a 7 inch touchscreen providing ease of operation, precise process control and data logging of process parameters. APPLIED MATERIALS P 5000 utilizes two process chambers and is equipped with a series of modules for both chamber types including load locks, substrate heating and cooling, and a revolutionary chamber design that decreases thermal gradient on the wafer plane. The etch chamber has both planar and cylindrical electrostatic chuck capability, enabling superior Uniformity across the entire etch surface. The chamber also features a low OTE loss unit that minimizes debris build up while maximizing wafer throughput. The chamber also features a shutter time optimization controller which enables fine control of the plasma etching parameters. AMAT P 5000 also features a highly efficient gas delivery machine and a newly designed high-concentration gas box with an advanced rate control tool, allowing the user to precisely control the process gases. The High Stable Gas Arc (HSGA) feature leads to a more consistent etch process by minimizing the arc variations. The advanced temperature control module ensures precise thermal uniformity across the wafer plane with ±2 degrees Celsius precision. AMAT P5000's isolation feature is designed to prevent the possibility of reverse ionizing particle damage to the wafer, ensuring that the wafer is properly protected from the harsh conditions of the etch environment. The asset also includes an advanced recipe editor that allows the user to define and store up to 250 recipes to meet different etching requirements for a variety of applications. P 5000 High Aspect Ratio Etch Model is an ideal choice for semiconductor fabrication and wafer etching applications that require consistent high aspect ratio etching. It offers maximum process control and reliability, while providing a cost effective solution for etching applications.