Used AMAT / APPLIED MATERIALS P5000E #9093627 for sale

AMAT / APPLIED MATERIALS P5000E is a high-performance PVD (physical vapor deposition) reactor. It is ideal for use in the semiconductor industry, as it is built to handle higher power, temperature, and pressure levels. This makes it capable of more efficient production processes for films, surfaces, and materials. AMAT P5000E features a scalable, modular design for easy installation and flexibility. It is ideal for advanced encapsulation, high thermal conductivity, barrier layers, interconnects, and other etching applications. APPLIED MATERIALS P5000 E has an environmental system that optimizes the substrate temperature to achieve homogeneity throughout the chamber. It is designed with two matched quartz ceiling plates and four electrodes to help maintain a uniform temperature and optimal plasma distribution. It also features a quartz bell jar for more efficient gas flow and safer operations, as well as a variable rotation rate to ensure uniform film deposition over various parts of the wafer. In addition, APPLIED MATERIALS P5000E's quartz bell jar is replaceable, increasing its longevity and decreasing maintenance costs. AMAT P5000 E is also equipped with an RF generator, allowing for greater control of the process to ensure uniformity and repeatability. Its power is adjustable for different processes, and it offers both Galvanic and DC-powered thermocouple technology for increased accuracy and reliability. P5000E has a built-in random access memory (RAM) to store process information and recall, for easy and fast diagnosis of the equipment's conditions and parameters. For enhanced safety, P5000 E is also equipped with an emergency door release, which unlocks the door and releases the vessel pressure in the event of an emergency. AMAT / APPLIED MATERIALS P5000 E also has multiple ports for flushing and venting, and its corrosion-resistant materials and durable construction make it resistant to wear and tear. In short, AMAT / APPLIED MATERIALS P5000E is a versatile and durable PVD reactor that is perfect for various etching and encapsulation applications in the semiconductor industry. It is designed for efficient and safe operations by making use of advanced components such as a quartz bell jar, RF generator, and thermocouple technology. Its power adjustable settings make it suitable for a range of processes, and its built-in RAM allows for quick diagnosis and easy process recall. With its corrosion-resistant construction and adjustable rotation rate, AMAT P5000E ensures superior films, surfaces, and materials deposition.