Used AMAT / APPLIED MATERIALS P5000W #9132649 for sale

AMAT / APPLIED MATERIALS P5000W is a plasma etch reactor. It has the capability to etch advanced device features in a variety of process materials. AMAT P5000W is a versatile tool with an inert loader/unloader, providing a wide range of process flexibility. APPLIED MATERIALS P5000W has been designed to be a cost-effective yet durable tool for the most demanding process needs. It is equipped with a high-ohm, low-area bias configuration allowing for precise control and repeatable process performance. The process chamber has an adjustable platform to accommodate substrates up to 8 inches in both length and width. It also has two gas boxes containing four RF, three microwave, and twenty mesh-available gases. P5000W supports up to four independent etch-processing tools, both single- and double-wafer applications, with three source Faraday cages for enhanced process control and thermal protection. The process chamber on AMAT / APPLIED MATERIALS P5000W reactor is also equipped with several environmental and safety features to ensure quality performance. These include a pair of bellows seals, pressure-indicated guard rings, and showering walls. It has a full system of temperature control with a proportional-integral-derivative (PID) control loop and basic safety interlocks for the RF box and the base wafer. It also has a self-testing, self-diagnosing interlock system of user-settable values that monitors pressure, temperature, and plasma consumption. AMAT P5000W has a medium frequency power supply that allows the reactive ions to be supplied at a high level of precision and reliability. The power supply is capable of up to 25MHz of microwave frequency and up to 2000W of RF power, with adjustable settings for fast etching processes. It is also equipped with an array of sensors that monitor pressure, temperature, and plasma consumption for optimal performance. With its high level of reliability and performance, APPLIED MATERIALS P5000W is an ideal choice for a variety of etching and deposition processes. This tool is designed to meet the requirements of both small and large production runs, with a capacity of up to eight wafer process runs. It is easy to maintain and offers efficient repeatability and accuracy for all types of etch and deposition processes.