Used AMAT / APPLIED MATERIALS P5000W #9132650 for sale

AMAT / APPLIED MATERIALS P5000W is a type of chemical vapour deposition (CVD) reactor that is used in the production of semiconductor devices and other thin-film electronics. This is accomplished through the deposition of a variety of materials onto the surface of a substrate. AMAT P5000W offers an efficient and highly reliable process for producing high-performance, complex integrated circuit designs. APPLIED MATERIALS P5000W utilizes a direct quartz crystal microbalance (QCM) equipment for measurement and on-line feedback control of the material being deposited. This allows for precise control of the process parameters to ensure a consistent and reliable product. The QCM system also allows for the detection of undesirable particles, providing real-time diagnostics. An optional inert gas control unit is available to reduce oxygen and moisture levels in the process chamber, further enhancing product yield and performance. P5000W is well-suited for plasma enhanced CVD and high temperature CVD applications, both of which are widely used in the production of advanced integrated circuits. This makes it ideal for the fabrication of nanostructures and other ultrafine features. Additionally, it offers a variety of chamber geometries and sizes for optimized wafer handling and uniformity. The machine is equipped with a remote computer interface for complete control and monitoring of the process. This allows for the automatic log-and-trend data collection, statistical process control, and process correction on-the-fly. The advanced software and powerful hardware makes AMAT / APPLIED MATERIALS P5000W a perfect choice for demanding applications. AMAT P5000W is also designed to be a safe and easy-to-use tool. The installation and setup of the asset are simplified, as the entire control software, hardware, and vacuum components are pre-installed. It also features a PECVD processgas box and various other safety accessories. In conclusion, APPLIED MATERIALS P5000W is an effective and reliable CVD reactor designed for the production of semiconductors and various other thin-film devices. The model provides precise control of the deposition process to ensure consistent product yield and performance. Additionally, it is designed with safety and ease-of-use in mind, making it an excellent choice for demanding applications.