Used AMAT / APPLIED MATERIALS Preclean chambers for Endura CL #293633114 for sale

ID: 293633114
Wafer Size: 12"
12" Part numbers: 0190-12085 8113160G001 10846-XE28-ANL1.
AMAT / APPLIED MATERIALS Preclean chamber for Endura CL is a reactor designed for use in CVD (Chemical Vapor Deposition) processes. This chamber is used in semiconductor production to provide a high quality clean area in which the deposition of thin film coatings in a localized area can be performed. The preclean chamber utilizes plasma-enhanced cleaning technology to achieve an ultra-clean substrate surface, which is then ready to receive delicate, protective coatings. This model of reactor features a horizontal single wafer loadlock chamber that is constructed with a stainless steel chamber body and a removable stainless steel cover with an air-lock seal and a back vent. It has an internal capacity of up to 100 liters and an operating temperature range of 0 to 150°C. The chamber also has an integrated cylindrical Process Control Module (PCM) that is connected to a control panel on top of the chamber for easy access to digital inputs and outputs, as well as analog controls. The PCM of the chamber is equipped with several components that are designed to achieve a high-yield pre-processing. It has an optical emission monitor, a process controllers, a process gas module, and a vacuum system. All of these components are designed to work together to create a controlled atmosphere in the chamber that is conducive to pre-processing. The preclean chamber has been designed with safety in mind. It is equipped with several safety features, such as pressure sensors, emergency shut-off switches, and an alarm system. In addition, it is also designed to be easy to maintain and upgrade. It has a robust design that is resistant to harsh chemicals and can easily be cleaned and serviced. In conclusion, AMAT Preclean chamber for Endura CL is a reliable and robust reactor designed for use in CVD processes. It is designed to provide a high-quality clean area in which thin film coatings can be applied. The chamber is equipped with several components that are designed to achieve a high-yield pre-processing, as well as several safety features to ensure safe operation of the reactor. This chamber is designed to be easy to maintain and upgrade and is resistant to harsh chemicals for reliable service over a long period of time.
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