Used AMAT / APPLIED MATERIALS PRODUCER EXT #9219513 for sale
URL successfully copied!
Tap to zoom
ID: 9219513
Wafer Size: 12"
Etcher, 12"
Chamber model: Producer
Bias gen: AE APEX 5513, 13.56 MHz, max 5000W
Bias match: AE
Source gen: AE OVATION 2760, 60MHz, max 2700W
Source match: AE
GDP Size: Y2O3, 14"
Turbo pump: EDWARDS STP-F2203C
Throttle valve: VAT pendulum valve DN-250
FRC: MKS FRCA-26349, 1000 / 1000 1/4 VCR
ESC: Dual zone ceramic ESC
Cathode chillers:
ChA: SMC INR-496-003D
ChB: SMC INR-496-003D
ChC: SMC INR-496-003D
Wall Chillers:
ChA: SMC INR-496-003D
ChB: SMC INR-496-003D
ChC: SMC INR-496-003D
Process kit coating: Y203
Cooling: HT 110 / 135 / FC 3283
Mainframe configuration:
IPUP Type: TOYOTAl 100L
Gas panel type: Next gen
VHP Robot: Dual blade
MF PC Type: CPCI
Factory interface configuration:
Frontend PC type: 306M Server
FIC PC Type: 306M Server
(3) Load ports
Atmospheric robot: YASKAWA Track robot
Side Storage: Left
Dry pumps & Scrubbers:
ChA: EDWARDS iH
ChB: EDWARDS iH
Chc: EDWARDS iH
MFC Configuration: UNIT PTI-125
MFC Configuration: UNIT PTI-125
EC2-61A / Gas name / Max flow / MFC Type
Gas 1 / C4F6 / 200 / UNIT PTI-125
Gas 2 / CHF3 / 400 / UNIT PTI-125
Gas 3 / CH2F2 / 100 / UNIT PTI-125
Gas 4 / CH2F2 / 200 / UNIT PTI-125
Gas 5 / C4F8 / 200 / UNIT PTI-125
Gas 6 / N2 / 200 / UNIT PTI-125
Gas 7 / O2 / 200 / UNIT PTI-125
Gas 8 / O2 / 2000 / UNIT PTI-125
Gas 9 / SF6 / 200 / UNIT PTI-125
Gas 10 / CF4 / 200 / UNIT PTI-125
Gas 11 / CF4 / 500 / UNIT PTI-125
Gas 12 / AR / 2000 / UNIT PTI-125
EC2-61B / Gas name / Max flow / MFC Type
Gas 1 / C4F6 / 200 / UNIT PTI-125
Gas 2 / CHF3 / 400 / UNIT PTI-125
Gas 3 / CH2F2 / 100 / UNIT PTI-125
Gas 4 / CH2F2 / 200 / UNIT PTI-125
Gas 5 / C4F8 / 200 / UNIT PTI-125
Gas 6 / N2 / 200 / UNIT PTI-125
Gas 7 / O2 / 200 / UNIT PTI-125
Gas 8 / O2 / 2000 / UNIT PTI-125
Gas 9 / SF6 / 200 / UNIT PTI-125
Gas 10 / CF4 / 200 / UNIT PTI-125
Gas 11 / CF4 / 500 / UNIT PTI-125
Gas 12 / AR / 2000 / UNIT PTI-125
EC2-061C / Gas name / Max flow / MFC Type
Gas 1 / C4F6 / 200 / UNIT PTI-125
Gas 2 / CHF3 / 400 / UNIT PTI-125
Gas 3 / CH2F2 / 100 / UNIT PTI-125
Gas 4 / CH2F2 / 200 / UNIT PTI-125
Gas 5 / C4F8 / 200 / UNIT PTI-125
Gas 6 / N2 / 200 / UNIT PTI-125
Gas 7 / O2 / 200 / UNIT PTI-125
Gas 8 / O2 / 2000 / UNIT PTI-125
Gas 9 / SF6 / 200 / UNIT PTI-125
Gas 10 / CF4 / 200 / UNIT PTI-125
Gas 11 / CF4 / 500 / UNIT PTI-125
Gas 12 / AR / 2000 / UNIT PTI-125.
AMAT / APPLIED MATERIALS PRODUCER EXT is a reactor designed for semiconductor fabrication processes, specifically for doping silicon wafers with boron gas. The reactor is designed to provide a complete boron implant solution for the manufacture of CMOS (CMOS) chips. AMAT PRODUCER EXT is the latest version of the PRODUCER series and was developed to provide a lower cost alternative to the single wafer reactor systems. APPLIED MATERIALS PRODUCER EXT reactor is a single wafer, vertical diffusion furnance optimized for producing boron dopant profiles. It is designed to produce dopant concentrations up to 10x higher than previous single wafer systems, and to allow for varying implant angles to create ultra fine line features. The reactor is also designed to be highly reliable and energy efficient. PRODUCER EXT utilizes an advanced plasma source to generate boron dopant gas. This plasma uses capacitively coupled RF energy to create the boron gas, which is then delivered to the wafer in a beam line furnace. This allows for precision dosing of the boron at desired depths on the wafer with less waste and higher productivity. AMAT / APPLIED MATERIALS PRODUCER EXT includes a high-resolution Substrate Viewer that allows users to monitor the implant spot profile and verify the placement accuracy. The user can control the depth of the implant using the onboard process control software. This ensures that the desired dopant concentration profile is achieved on each wafer. AMAT PRODUCER EXT is designed with modular components that are easy to install and maintain. This makes it easy to scale up production and reconfigure the system for different implant profiles. Additionally, the small size of APPLIED MATERIALS PRODUCER EXT allows it to be installed in a variety of facilities, from labs to mass production factories. PRODUCER EXT reactor is an ideal solution for semiconductor fabrication processes, providing a reliable and cost-effective solution for generating boron implant profiles. It is designed to offer highly precise dosing capabilities and high yields with minimal waste and excellent power efficiency. It can be installed in a variety of facility types and sizes and is highly configurable.
There are no reviews yet