Used AMAT / APPLIED MATERIALS PRODUCER GT ETERNA #9305821 for sale

AMAT / APPLIED MATERIALS PRODUCER GT ETERNA is an industry-leading advanced deposition equipment designed specifically for modern semiconductor fabrication. It is one of the most advanced and reliable deposition systems available, designed to help you achieve the highest possible yield and lowest post-deposition process waste. The GT ETERNA offers a range of features such as a fully automated substrate size discrimination between large, small and mixed size wafers, as well as wafer-level uniformity control with integrated ICOS® technology. This system also allows for high-density plasmas and offers advanced gas flow technology to ensure maximum uniformity and throughput. The GT ETERNA offers a variety of deposition chamber installation options with uniformized components, including both gas source and coil systems. It is also customizable to your needs with a wide range of process parameters available, providing a flexible platform to fit any semiconductor process. Additionally, the GT ETERNA is equipped with a rotatable load-lock unit, allowing for exchange of wafers in the same fashion as chamber-level processes. Furthermore, the GT ETERNA offers an innovative low-metal design, allowing for improved performance in chamber maintenance, as well as a contamination-resistant lid that eliminates crack formation and eliminates the need for extra masks. It also features automated vision control to identify edge defects, allowing for improved substrate-edge quality. Additionally, the machine offers easy operation and maintenance, with quick-release mechanisms for port covers and uncomplicated loading/unloading systems for wafers. In conclusion, AMAT PRODUCER GT ETERNA is one of the most advanced and reliable deposition systems available on the market. Its unique features and flexibility make it an ideal choice for modern semiconductor fabrication, allowing for maximum uniformity, throughput, and yield. Its innovative design and cutting-edge technologies make it an essential tool for any modern semiconductor facility.