Used AMAT / APPLIED MATERIALS Producer GT SiCoNi #9375200 for sale

AMAT / APPLIED MATERIALS Producer GT SiCoNi is an advanced, high-efficiency Chemical Vapor Deposition (CVD) chamber designed for use in the semiconductor industry. This reactor utilizes a patented porous SiCoNi (Silicon Carbide Nickel) coating on the processing surfaces of the CVD chamber for improved uniformity, increased throughput, and reduced CMP loading. The patented SiCoNi coating provides a unique combination of chemical, thermal, and mechanical properties. It has excellent deposition uniformity, allowing for precise process control and repeatability. Its thermal stability also allows for enhanced CVD process stability. The combination of high thermal and chemical resistance also provides for improved CMP loading during cleaning. AMAT Producer GT SiCoNi CVD chamber is equipped with high-temperature pulsed CMP loading capability, allowing for superior CMP loading and quality control during the cleaning process. It also features a low-flow high-performance Cooljet™ clean system, which rapidly removes contaminants from the chamber and maintains the chamber's integrity. APPLIED MATERIALS Producer GT SiCoNi is equipped with multiple process gases, including nitrogen and oxygen, to provide optimal process compatibility. It possesses a low-energySi-based injector, allowing for lower etch temperatures and improved process control and stability. To enhance the stability and repeatability of process parameters, the reactor also features a dual-zone hot-wall design for uniform temperature control. Producer GT SiCoNi is capable of processing wafers up to 200mm in size with a fully-automated load lock for convenient wafer loading and unloading. Its advanced temperature control system ensures reliable process stability during long production runs and also allows for easy process set-up. In addition, the reactor is designed to meet the most stringent safety standards, ensuring maximum safety in an industrial environment. AMAT / APPLIED MATERIALS Producer GT SiCoNi is a versatile CVD chamber designed to meet the high-quality and performance expectations of the semiconductor industry. Its advanced process capabilities, coupled with the advanced SiCoNi coating, provide superior process control and uniformity. Its versatility and performance make it an ideal solution for the most challenging semiconductor processes.