Used AMAT / APPLIED MATERIALS Producer GT #293822848 for sale

AMAT / APPLIED MATERIALS Producer GT is a plasma enhanced chemical vapor deposition (PECVD) reactor used for depositing thin films of silicon-containing materials such as polysilicon, silicon nitride, and silicon dioxide. The reactor is engineered to optimize advanced processing performance and deliver high uniformity and top-notch film quality at rates up to 1000nm/hour. The dual RF source configuration (split cored) allows for flexible power and rate control of the deposited material to meet the needs of specific applications. The large susceptor size and enhanced uniformity control make it ideal for depositing material onto large substrates such as wafers while still enabling precise adjustment for device dimensions. The chamber is divided into two vertical process zones with independent pressure control and separate vacuum levels for the upper and lower zones. This design allows for deposition of material at different rates as well as prevents cross contamination between different processes. In addition, the reactor is designed with advanced vertical cooling features to maintain uniform temperature control throughout the chamber and between the two vertical process zones. An advanced closed-loop testing (CLT) equipment rapidly measures and adjusts process parameters in real time, thus ensuring precise film quality and very high uniformity. The PECVD system is built with a variety of options for different applications, including sidewall deposition, high rate deposition, low k deposition, planarization, etch/strip and multi-layer/stack deposition. Additionally, the unit can be further equipped with advanced gas supply systems, such as the Dynamic Low Fluoride (DLF) option that helps minimize any possible contamination. In short, AMAT Producer GT PECVD reactor is an advanced machine with easy to use controls and excellent uniformity control, designed for outstanding deposition performance and delivering top-notch film quality with the flexibility to meet specific process requirements.