Used AMAT / APPLIED MATERIALS Producer GT #9152528 for sale

AMAT / APPLIED MATERIALS Producer GT
ID: 9152528
Wafer Size: 12"
Vintage: 2017
Chambers, 12" 2017 vintage.
AMAT / APPLIED MATERIALS Producer GT is a world-leading plasma reactor that is widely used in the semiconductor industry for etching. It delivers controllable, high-density energies that enable precise control in a range of substrate applications, such as thin-film, bulk semiconductor, and display. AMAT Producer GT utilizes a unique atmospheric pressure, low-energy, inductively-coupled-plasma discharge, and is highly reliable, with an excellent process uniformity across the substrate. The plasma process is tuned to the application by the adjustable supply and bias powers, making it suitable for a wide range of materials and films. The closed loop control of the process enables the highest precision with repeatable results, even under high production demands. The process temperature is kept low, under 200°C, as to prevent surface contamination or degradations. Both ion and electron sources, together with additional pressure control, deliver a stable process, ensuring reliable production output. APPLIED MATERIALS Producer GT offers a wide range of additional features, all aimed at increasing process speed and throughput. Among those are the fast electrode arc-over protection, quick re-ignition, and remote sample analysis. The process gas flow system can be independently tuned for each application, delivering the best etching profile. The reactor is highly efficient and cost-effective, and its modular design makes maintenance and repairs a straightforward process. The process chamber is made out of corrosion-resistant materials, which helps increase the reactor's long-term reliability, as well as its safety. All in all, Producer GT is a very versatile and reliable reactor, designed to produce the highest resolution of etching quality in the most efficient way possible. Its unique and powerful design, combined with the various features it offers, make the reactor ideal for the most intricate and demanding semiconductor applications.
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