Used AMAT / APPLIED MATERIALS Producer GT #9170202 for sale
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ID: 9170202
Wafer Size: 12"
Vintage: 2011
PECVD System, 12"
Chamber configuration:
A: Eterna FCVD
B: SACVD
C: Eterna FCVD
Items: FI
FI Robot
FI Robot controller
Aligner
Cool station
FES
FIS
TCS / RT
AMAT FFU
Items: LL
LL Upper lifts
LL Upper lift drivers
LL Lower lifts
LL Lower lift drivers
LL Pump
LL Foreline
Items: Buffer
FX Robot
FX Robot linkage (Bat wing / Bridge)
Robot blades
Robot controller
LCF
Buffer pump
Buffer foreline
MF Controller
Chamber: A
RPS
Upper lid stack (Gas box, Faceplate, Isolator)
Ceramic process kit
Heaters: Pedestal
Pin lifts
Pin lift driver
Heater lifts
Heater lift drivers
Ch FL, TV, Iso valve
Gas panel (MFC, LFM intact)
Chamber controller
Chamber: B
RPS
Upper lid stack (Gas Box, Faceplate, Isolator)
Ceramic process kit
Heaters
RF Filters
Pin lifts
Pin lift driver
Heater lifts
Heater lift drivers
Ch FL, TV, Iso valve
Gas panel (MFC, LFM intact)
Chamber controller
Chamber: C
RPS
Upper lid stack (Gas Box, Faceplate, Isolator)
Ceramic process kit
Heaters: Pedestal
Pin lifts
Pin lift driver
Heater lifts
Heater lift drivers
Ch FL, TV, Iso valve
Gas panel (MFC, LFM intact)
Chamber controller
Currently installed and stored in cleanroom
2011 vintage.
AMAT AMAT / APPLIED MATERIALS Producer GT Reactor is a technologically advanced device designed for semiconductor and related industries. This tool helps to manufacture high-grade materials and components that are essential in the production of today's technology. TheProducer GT is a thermal plasma chemical vapor deposition (CVD) reactor, with a process chamber size 240mm in diameter and 350mm deep. It is equipped with a high-performance Twin Chamber Tunnel (TCT) source, allowing for the production of uniform and repeatable material properties without thermal gradients from parts of the substrate closest to the source compared to regions furthest from the source. The reactor is built with the Intelli-Match™ Advanced Source Matching and Modeling technology, which helps reliably manage reactor power control. It alsofeatures automatic frequency source matching between the primary and secondary chambers, as well as impedance control equipment for safe operation. AMAT Producer GT has a very efficient gas delivery system, with a gas atomization and injectionportal for accurately controlled gas composition and delivery. The reactor also features an adjustableprocess chamber pressure, throughout the range from rough vacuum to atmospheric pressure, for achieving uniform process conditions over the entire wafer substrate. It is fitted with advanced temperature control capabilities, with an advanced temperature feedback control unit and reaction layer growth control capabilities. Its thermal process chamber features a robust temperature monitor and control with an accuracy of ±2°C. The reactor also features a high-voltage, direct current (HV-DC) source power machine, designed to minimize plasma perturbations and generate electron cyclotron resonance waves, improving the plasma confinement and homogeneity. Its HV-DC power source also provides maximum power density control and maximum plasma density, for faster deposition rates. APPLIED MATERIALS Producer GT Reactor is capable of running a wide range of process chemistries, including films such as TiN, Al2O3, SiO2, PECVD, and photoresist removal, as well as thermal processes such as thermal oxidation, diffusion, and annealing. It is also capable of running batch processes in conjunction with APPLIED MATERIALS'Ventura® Central Platform. The tool is equipped with a powerful software suite, designed to improve productivity and enable enhanced diagnostic capabilities. It is integrated with AMAT / APPLIED MATERIALS PreQual software suite, allowing for quick and efficient process development and production of high-quality films. TheProducer GT is designed to support ultra-high-volume manufacturing with maximum throughput and superior reliability - even in the most demanding environments. It is also certified for installation in hazardous areas, with an ISO Class 5 clean room evaluation for hazardous environments. This reliable tool is capable of consistently producing outstanding results for its users.
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