Used AMAT / APPLIED MATERIALS Producer GT #9198996 for sale
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ID: 9198996
Wafer Size: 12"
Vintage: 2008
CVD System, 12"
Number of loadports: 4
Factory interface model: 5.4
AMHS Configuration: OHT
Chamber A:
SACVD Twin
Process: HARP USG
RPS Type: 6 Litre
Heater type/Part number: Vacuum chuck
Process kit type: HARP kit
Chamber B:
SACVD Twin
Process: HARP USG
RPS Type: 6 Litre
Heater type/Part number: Vacuum chuck
Process kit type: HARP kit
Chamber C:
SACVD Twin
Process: HARP USG
RPS Type: 6 Litre
Heater type/Part number: Vacuum chuck
Process kit type: HARP kit
Computers:
FE Computer type: FES
FI Computer type: FIS
RT Computer type: CL7
Misc hardware:
FI Robot type: KAWASAKI Track
Buffer robot type: GT
Remote AC: 208V
Heat exchanger 1: Unisem
FI Robot blade type: Aluminum
Buffer robot blade type: Ceramic
LCF/Wafer detect: LCF
Roll around monitors: (2)
Ozone cabinet: Inusa
Number of ozone generators: 3 MKS
Gas panel configurations:
Gas box type: 1-1/8 C-Seal surfacemount
Stick 1: NF3 - 15000sccm
Stick 2: AR - 15000sccm
Stick 3: N2 - 5000sccm
Stick 4: N2 - 50000sccm
Stick 5: He - 30000sccm
Liquid 1: TEOS - 7g/min
2008 vintage.
AMAT / APPLIED MATERIALS Producer GT is a highly advanced deposition system that offers a range of customizable solutions for deposition processes. This reaction chamber includes a fully flexible source architecture, allowing for deposition recipes to be tailored to specific customer needs. AMAT Producer GT is designed to provide precise control over substrate temperature, pressure, and flow rate while utilizing continuous web deposition techniques. The main structure of APPLIED MATERIALS Producer GT reaction chamber consists of a high-quality, metal vacuum chamber that is capable of supporting a wide variety of substrate sizes and shapes. Located within the vacuum chamber is the source, which is composed of a high-power RF generator and crucible. The produce reactor also features advanced scanning technologies with auto-alignment capabilities, providing precise control and uniform deposition. This ensures consistent coverage for all substrates, regardless of shape and size. The RF generator and crucible are connected to a deposition chamber, which utilizes a CVD source to produce aluminized films. The CVD source provides a highly abundant source of the film-forming gas, allowing for extremely thin films to be deposited onto multiple substrates at once. Additionally, the deposition chamber is able to obtain extremely low substrate temperatures, up to 20oC. This allows for improved film quality, with possibility for high aspect ratio depositions and reduced contact resistance. In order to maximize efficiency and productivity, Producer GT is equipped with a range of advanced tools. The on-board robot arm is designed to load and unload substrates quickly, minimizing downtime between processes. The reaction chamber also features a web transport system, whereby a full roll of substrate can be loaded and unloaded at one time. This increases throughput and allows for larger batch sizes to be handled in one run. Overall, AMAT / APPLIED MATERIALS Producer GT is a highly advanced and customizable solution that can provide precision depositions and increased productivity. This reaction chamber features a range of advanced technologies, such as automated scanning, CVD source, robot arm, and web transport system, allowing it to be tailored to specific process requirements.
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