Used AMAT / APPLIED MATERIALS Producer GT #9203130 for sale

AMAT / APPLIED MATERIALS Producer GT Reactor is a versatile, high-efficiency epitaxial growth equipment designed for the commercial production of compound semiconductor materials. The system facilitates the growth of layers with various growth temperatures and durations, enabling the deposition of high-quality device structures essential for the manufacture of advanced semiconductor products. The reactor is built with an advanced furnace stage design that allows for precise growth temperature control and uniform heating. AMAT Producer GT reactor is equipped with diffusion, oxidation, and thermal treatment capabilities to improve epitaxial layer quality. It also includes an in-situ, four-zone, gas diffusion unit that provides precise gas flow control. Additionally, it incorporates a high-performance substrate thermal stage platform for substrate motion and temperature control, including automatic substrate transfer without manual intervention. APPLIED MATERIALS Producer GT machine also features an advanced gas bubbler to safely and conveniently provide a constant flow of precise mass flow and gas concentration. This ensures that all components are exposed accurately to their respective reactant gases during the desired exposure period, achieving consistent device performance for each batch. The tool's automation architecture is designed for optimized workloads with high throughput without compromising on asset performance. The individualized task management features such as recipe setting, alarm response handling, and queue priority management maximize model utilization. The integrated process intelligence also enables users to visualize process parameters quickly by providing an intuitive graphical user interface for diagnostics and recipe optimization. This deliver configurable, multi-dimensional views of process data, enabling reliable and accurate decision-making. Producer GT Reactor maximizes process flexibility, allowing users to switch from one recipe to another quickly and easily. Moreover, the efficient equipment technology minimizes gas consumption, leading to an enhanced process yield, and reduces downtime. By delivering high-quality, highly complex semiconductor device structures in a cost-effective manner, the reactor offers great value proposition for high-volume, commercial semiconductor device production.