Used AMAT / APPLIED MATERIALS Producer GT #9208937 for sale

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ID: 9208937
Wafer Size: 12"
Vintage: 2011
CVD System, 12" Items: FI FI Robot FI Robot controller Aligner Cool station FES FIS TCS/RT FFU Items: LL LL Upper lifts LL Upper lift drivers LL Lower lifts LL Lower lift drivers LL Pump LL Foreline Items: BUFFER FX Robot FX Robot linkage (batwing/bridge) Robot blades Robot controller LCF Buffer pump Buffer foreline MF Controller Chamber A- ETERNA FCVD RPS Upper lid stack (gas box, face plate, isolator) Ceramic process kit Heaters: Pedestal Pin lifts Pin lift driver Heater lifts Heater lift drivers Ch FL, TV, Iso valve Gas panel (MFC, LFM intact) Chamber controller Chamber B- SACVD RPS Upper lid stack (gas box, face plate, isolator) Ceramic process kit Heaters RF Filters Pin lifts Pin lift driver Heater lifts Heater lift drivers Ch FL, TV, Iso valve Gas panel (MFC, LFM intact) Chamber controller Chamber C- ETERNA FCVD RPS Upper lid stack (gas box, face plate, Isolator) Ceramic process kit Heaters: Pedestal RF filters: N/A Pin lifts Pin lift driver Heater lifts Heater lift drivers Ch FL, TV, Iso valve Gas panel (MFC, LFM intact) Chamber controller 2011 vintage.
AMAT / APPLIED MATERIALS Producer GT is a high-throughput, single-chamber, horizontal, closed-frame reactor used for the production of monocrystalline and polycrystalline semiconductor materials. This equipment offers high throughput capabilities, resulting in reduced cycle times, as well as improved material yields. The system includes an advanced graphical user interface, allowing for fast and easy parameter control. It also consists of a turbo-pumped, horizontally-supported chamber for optimal thermal performance and uniformity. AMAT Producer GT includes an integrated source crucible with an advanced temperature control unit for perfect crystal growth. An automatic substrate holder allows for precise substrate positioning and controlled movement of the substrate. It also has an advanced pyrometer for more accurate temperature readings, as well as a low-pressure in-situ gas injection machine for optimal growth conditions. APPLIED MATERIALS Producer GT is conveniently sized for easy installation and operation in a standard semiconductor fabrication lab. It utilizes high-performance magnets that provide optimal and uniform field intensity for uniform crystal growth. It is also equipped with a dynamic cooling tool to reduce thermal cycling of the chamber and reduce contaminant deposition. Additionally, the asset includes advanced substrate edge profiling capabilities to ensure uniform crystal growth, as well as an integrated wafer cooling model to reduce thermal stress. Overall, Producer GT is an advanced, ultra-fast semiconductor materials production reactor that provides unparalleled performance, reliability, and efficiency. With its advanced user interface, robust temperature control equipment, integrated source crucible, dynamic cooling system, and advanced wafer cooling unit, this high-performance reactor is the ideal choice for state-of-the-art semiconductor production.
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