Used AMAT / APPLIED MATERIALS Producer GT #9208937 for sale
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ID: 9208937
Wafer Size: 12"
Vintage: 2011
CVD System, 12"
Items: FI
FI Robot
FI Robot controller
Aligner
Cool station
FES
FIS
TCS/RT
FFU
Items: LL
LL Upper lifts
LL Upper lift drivers
LL Lower lifts
LL Lower lift drivers
LL Pump
LL Foreline
Items: BUFFER FX
Robot
FX Robot linkage (batwing/bridge)
Robot blades
Robot controller
LCF
Buffer pump
Buffer foreline
MF Controller
Chamber A- ETERNA FCVD
RPS
Upper lid stack (gas box, face plate, isolator)
Ceramic process kit
Heaters: Pedestal
Pin lifts
Pin lift driver
Heater lifts
Heater lift drivers
Ch FL, TV, Iso valve
Gas panel (MFC, LFM intact)
Chamber controller
Chamber B- SACVD
RPS
Upper lid stack (gas box, face plate, isolator)
Ceramic process kit
Heaters
RF Filters
Pin lifts
Pin lift driver
Heater lifts
Heater lift drivers
Ch FL, TV, Iso valve
Gas panel (MFC, LFM intact)
Chamber controller
Chamber C- ETERNA FCVD
RPS
Upper lid stack (gas box, face plate, Isolator)
Ceramic process kit
Heaters: Pedestal
RF filters: N/A Pin lifts
Pin lift driver
Heater lifts
Heater lift drivers
Ch FL, TV, Iso valve
Gas panel (MFC, LFM intact)
Chamber controller
2011 vintage.
AMAT / APPLIED MATERIALS Producer GT is a high-throughput, single-chamber, horizontal, closed-frame reactor used for the production of monocrystalline and polycrystalline semiconductor materials. This equipment offers high throughput capabilities, resulting in reduced cycle times, as well as improved material yields. The system includes an advanced graphical user interface, allowing for fast and easy parameter control. It also consists of a turbo-pumped, horizontally-supported chamber for optimal thermal performance and uniformity. AMAT Producer GT includes an integrated source crucible with an advanced temperature control unit for perfect crystal growth. An automatic substrate holder allows for precise substrate positioning and controlled movement of the substrate. It also has an advanced pyrometer for more accurate temperature readings, as well as a low-pressure in-situ gas injection machine for optimal growth conditions. APPLIED MATERIALS Producer GT is conveniently sized for easy installation and operation in a standard semiconductor fabrication lab. It utilizes high-performance magnets that provide optimal and uniform field intensity for uniform crystal growth. It is also equipped with a dynamic cooling tool to reduce thermal cycling of the chamber and reduce contaminant deposition. Additionally, the asset includes advanced substrate edge profiling capabilities to ensure uniform crystal growth, as well as an integrated wafer cooling model to reduce thermal stress. Overall, Producer GT is an advanced, ultra-fast semiconductor materials production reactor that provides unparalleled performance, reliability, and efficiency. With its advanced user interface, robust temperature control equipment, integrated source crucible, dynamic cooling system, and advanced wafer cooling unit, this high-performance reactor is the ideal choice for state-of-the-art semiconductor production.
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