Used AMAT / APPLIED MATERIALS Producer GT #9233074 for sale
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ID: 9233074
Wafer Size: 12"
Vintage: 2007
CVD System, 12"
Control system: Device net protocol
EFEM Communication: SFEM
Wafer sliding detection sensors: LCF
Signal tower: Common SPEC
Door interlock sensor
Pressure difference interlock: LL->TM->Chamber
Slit valve:
L-Motion
No viton o-ring
Air regulator
EYE Mark display on M/C: LP1, LP2
Chamber A / B / C
Gas box
Turbo pump
RPC
RF Generator
Match
Electric valve & Load lock & Tm installed
TM Blade: ALN
No o-ring in chamber region
No gate valve o-ring & Air regulator
Missing / Detaching parts:
(6) HARP AIN Heaters P/N: 0010-59796
Q-Code Q400-168177
FI. RT, FE Computer
Practical preventing system in EFEM: 0.065µm Filter / Venting air
Process: HARP, BPSG, ARC, P-TEOS
Blue electrostatic chuck: Low temp 300° C
Turbo screen location: Below chamber
Heat exchanger: SUS Connector & Power vaccine
Upgrade list pin mechanism: Dual lock list pin
RF Reflect filter system / BIAS: Auto match
Heat exchanger coolant: ZT180
Chamber lift speed: Stepping motor
ESC Water leak
RF Generator reflect power: Below set point 0.5%
Input / Output port stage: OHT
FOUP Capability: (25) Slots
System monitor: LCD
Remote monitor: Keyboard, LCD
Gas line: 5- RA surface mounted c-seal
Gas configuration: C3H6, O2, NF3
Gas line polishing: E/P 5-RA
Filter: SUS316 SS/NF3 Hastelloy
Gas box temperature: Display by digital gauge
Negative voltage MFC signal: Display interlock
Chamber pump: SAMSUNG
Load lock & TM Pump
Tempered type: Capacitance manometer for chamber pressure control
Pressure transducer for chamber: ATM Switch
TM & Load lock fore line shut-off valve: Electric valve
General power & UPS Power: AC Rack design change for VDP
Ground for D-net: Chassis
Circuit safeguard: Circuit breakers
Internal utility line color: SEMI Standard
Head exchanger: Pressure control
2007 vintage.
AMAT / APPLIED MATERIALS Producer GT is a vertical electrochemical deposition reactor engineered to offer deposition process solutions for the manufacture of advanced circuitry. This reactor is a beaked, cylindrical vessel designed to provide quality deposition processes on a full range of substrates such as Aluminum, Copper and Titanium. It comes in two models, AMAT Producer GT-800 and APPLIED MATERIALS Producer GT-1000, and features a tunable process chamber for multiple process capabilities such as copper plating, electroless copper plating, ALD, and CVD processes. The design is based on a high-aspect ratio beaker architecture that combines a vertical vessel, low thermal mass capacitor, and integrated substrate support. This geometry creates a uniform, scalable process with low-resistance electrical contacts that are in contact with a uniform space between the contacts and the walls of the reaction vessel. Producer GT also comes with advanced customizable software and hardware options for accurate process control. This allows for easy operation and reproducible electroplating results with realistic and consistent process parameters. The process chamber is protected from contamination thanks to strict process controls and vacuum wash-down procedures. The design combines an optimized, user-friendly liquid delivery equipment with sophisticated pump control logic, allowing for precise, consistent, repeatable electroplating solutions at high throughput. The reactor is equipped with advanced temperature management for accuracy and repeatability of programs, as well as an integrated humidity control system which ensures controlled moisture levels during the process. The advanced control unit also provides real-time monitoring of the process with measurements in time, temperature, pressure, thickness, and other critical process parameters. The variety of customizable options on AMAT / APPLIED MATERIALS Producer GT reactor provides exceptional electrochemical deposition solution capabilities. It is capable of depositing a wide range of materials from a broad range of substrates with exceptional process control. The advanced, user-friendly machine offers increased flexibility and repeatable results.
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