Used AMAT / APPLIED MATERIALS Producer GT #9235066 for sale

AMAT / APPLIED MATERIALS Producer GT Reactor is an advanced, advanced materials deposition (AMD) chamber used for shallow trench isolation (STI), barrier metal and passivation layers in the production of semiconductor devices. This advanced technology, combined with a high degree of manufacturing precision, accuracy, and robustness, makes AMAT Producer GT Reactor a highly reliable and efficient deposition equipment for the fabrication of advanced semiconductor devices. APPLIED MATERIALS Producer GT Reactor includes several state-of-the-art features and capabilities. The system provides a high rate of production, and is capable of executing multiple complex processes in parallel. The main components of the unit include an automated deposition chamber, a susceptor and wafer transporter, an epi-ready chamber, a dual-chamber microwave generator and several additional accessories. The reactor operates by exposing a silicon wafer to a high vacuum environment. A susceptor lifts the wafer to a process position on the production stage, while a wafer transporter carries the wafer from the stage back to the storage bay. The susceptor, wafer transporter, and production stage are all powered electrically. The epi-ready chamber is where the ultimate deposition process takes place. A precise delivery machine within the chamber supplies material -- such as silicon, silicon dioxide or silicide -- from the source material bin onto a heated susceptor in the form of a thin, uniform film. This deposited material is then polished, etched or subjected to other processes that create desired features on the wafer. The microwave generator is the most sophisticated component in the tool. It is used to generate microwave energy to precisely heat the wafer and enable highly accurate and consistent thin film deposition. The dual-chamber microwave generator for Producer GT Reactor includes four independent antennas, two microwave control box units, and multiple RF sources. The microwave generator also provides for extremely low temperature substrate heating that is both energy efficient and is uniform across the substrate, thus preventing thermal damage to the substrate. Other advanced features of the asset include advanced safety interlocks, automatic calibration of the susceptor height and temperature, and closed-loop temperature control. All these features make AMAT / APPLIED MATERIALS Producer GT Reactor one of the most highly advanced and reliable deposition systems for advanced semiconductor applications.