Used AMAT / APPLIED MATERIALS Producer GT #9251458 for sale

AMAT / APPLIED MATERIALS Producer GT is a plasma-enhanced chemical vapor deposition (PECVD) equipment used for the production of semiconductor materials such as silicon oxide, silicon nitride, and low-k dielectrics. It is a powerful, reliable tool that can deposit high-quality thin films on substrates. The aircraft grade aluminium chamber design of AMAT Producer GT allows it to provide a uniform plasma over a large substrate area. A multi-source RF generator with power up to 500 watts provides precise control of the RF applied on the chamber. This gives the user complete control over the deposition parameters, enabling the production of films with highly uniform thickness and composition. APPLIED MATERIALS Producer GT achieves deposition temperatures as low as 250 - 400 ℃ with a fast ramp-up time, suitable for a variety of processes such as oxide deposition and surface passivation. Its intuitive gas flow control system enables a wide variety of gas delivery, enabling customised thin film recipes for different applications. Producer GT is capable of providing stable plasma over long deposition runs, introducing minimal particles and avoiding chamber wall redeposit. It also ensures plasma uniformity and repeatability across all substrates and process parameters, making it a suitable tool for high-volume production. AMAT / APPLIED MATERIALS Producer GT incorporates a very robust design to minimise process drift and optimise yield for multi-chamber systems. Its advanced diagnostics provide rapid feedback on the consistency of the wafer throughput, enabling superior process control. Furthermore, its on-board fault detection and isolation unit ensures high machine availability, reducing downtime and associated cost. Overall, AMAT Producer GT is an ideal tool for accurate deposition of dielectric and surface passivation thin films in high-volume production. Its aircraft grade aluminium chamber design allows the creation of a precise and uniform plasma over a large substrate area. The multi-source RF generator and integrated gas flow control tool give users complete control over deposition parameters. Moreover, its advanced diagnostics, fault isolation asset, and robust design help to ensure superior process control and high model availability.