Used AMAT / APPLIED MATERIALS Producer GT #9251459 for sale

AMAT / APPLIED MATERIALS Producer GT is a high productivity 300 mm vertical diffusion chemical vapor deposition reactor, ideal for the production of large volumes of thin-film semiconductor materials. The reactor is designed to accommodate high-volume manufacturing, process control, and uniformity requirements. The vertical geometry of this reactor ensures high throughput with low deposition rates, while providing excellent uniformity across the entire wafer surface. AMAT Producer GT features a high-temperature, single zone reactor design. It is equipped with three 6 kW, 800 ampere RF generator power supplies, in addition to a three-axis RF transformer. This equipment is ideal for the deposition of thin-film materials, such as silicon, tungsten, titanium, tantalum, copper, and aluminum. APPLIED MATERIALS Producer GT is specifically designed to optimize layer uniformity. The temperature of the chamber is closely regulated and cooling the gasses prior to introduction into the deposition chamber significantly reduces the chamber temperature. The reactor features a multi-stage load lock system, providing process flexibility and stability across multiple chambers. Process parameters, including temperature, pressure, and gas flow, can be precisely adjusted. It also uses a four-chamber gas distribution unit, which further reduces process variability. In addition, an optional gas barrier machine provides effective contamination suppression within the deposition chamber. To optimize process control, Producer GT is equipped with a comprehensive suite of real-time diagnostic and control tools. These tools allow for the real-time monitoring of all critical process variables, as well as the ability to quickly adjust process parameters to address any setting or operational changes. This ensures that uniform results are consistently achieved across high-volume production runs. AMAT / APPLIED MATERIALS Producer GT also features a sample loadlock, which is specifically designed to accommodate 300 mm, 25 mm, and 12 inch wafer sizes. The sample loadlock features a wafer-handling port, a gas purge port, a gas manifold, and sample positioning controls, all of which provide complete control over sample insertion and removal from the loadlock chamber. AMAT Producer GT provides a versatile, reliable, and reliable production environment for the fabrication of high-quality thin-film semiconductor materials. Its advanced design ensures excellent layer uniformity, process flexibility, and process control, while its rugged build ensures that it meets the demanding requirements of high-volume manufacturing.