Used AMAT / APPLIED MATERIALS Producer GT #9253662 for sale

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ID: 9253662
Wafer Size: 12"
Vintage: 2015
PECVD System, 12" SiCoNi Clean chamber Other options and factory interface options: Additional loadport Infopad pos A or B Configurable colored lights Front facing intake plenum Upper E84 sensors and cables TIRIS With RF E99 Carrier ID Operator access switch Light curtain Remote options: Heat exchanger hoses and manifolds Facilities UPS interface Remote flat panel monitor on stand Through the wall flat panel monitor with keyboard Non standard request: Kit (2) Additional heat exchangers Manifolds H Chamber FI Removal Producer GT custom option Pre-align center single axis 5.4 FI New core Power vaccine AMK Handling items 2015 vintage.
AMAT / APPLIED MATERIALS Producer GT is a vacuum deposition equipment used for processing semiconductor devices. This reactor enables high-density applications of conformal, uniform thin films for various layers of integrated circuits. It is a fully automated tool designed to improve process uniformity, productivity and yield. AMAT Producer GT comes equipped with a high-capacity load lock system which allows continuous high vacuum operation. This unit also employs an advanced heating technology with a temperature range of up to 600°C for more demanding processes. Additionally, the reactor has a wide range of deposition sources and multiple process chambers. This allows allows for multiple materials to be processed at the same time, providing an efficient platform for various deposition processes. APPLIED MATERIALS Producer GT utilizes several advanced features for enhanced process performance. This includes piezo motors which facilitate precise motion control of the wafer chuck, while an Advanced Plasma Control (APC) machine ensures optimal plasma conditions. In addition, this reactor also utilizes a variable pressure tool to allow adjustment of chamber pressure to the optimal range within the process window. Producer GT is ideal for high-density applications like CMOS and MEMS, thin-film magnetic and optical devices, and other advanced deposition processes. It provides superior film uniformity as compared to conventional deposition techniques, enabling highly uniform films even for vertically scaled geometries. Moreover, the combination of plasma and up to 600°C temperature enable advanced deposition processes including ALD/CVD. This asset is highly rugged, with a light and compact design which makes it easy to install and maintain. Overall, AMAT / APPLIED MATERIALS Producer GT is an advanced process tool that enables high-density applications in the semiconductor industry. It provides an effective solution for deposition processes that require exacting control of thickness, temperature, pressure, and uniformity. This model is highly reliable and provides consistent and repeatable processes, helping to reduce cycle times and increase the precise results desired.
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