Used AMAT / APPLIED MATERIALS Producer GT #9282971 for sale

AMAT / APPLIED MATERIALS Producer GT is an advanced reactor designed for materials processing applications. It is a type of plasma enhanced chemical vapor deposition (PECVD) machine. This reactor utilizes the enhancement of ionized plasmas to form material films and coatings. AMAT Producer GT has a high-strength ceramic-iron substrate holder designed to withstand higher temperatures. This substrate holder has a quartz crystal susceptor that can reach temperatures up to 300°C. It also has two ceramic-iron heaters which allow for higher temperatures up to 400°C. APPLIED MATERIALS Producer GT reactor is built with a multi-circle-fuel design. This design utilizes a unique multiple ring configuration to produce uniform plasma deposition. The multi-circle-fuel design also enables precise process control for flawless transition between deposition and clean-up cycles. The reactor is equipped with a unique dual-zone feature, which can program different plasma conditions for different types of materials. Producer GT utilizes advanced electron cyclotron resonance (ECR) technology. This advanced technology enables high-density plasmas with improved ionization. This increased ionization enables faster deposition rates and higher uniformity in material films and coatings. The ECR equipment also reduces the production costs associated with the deposition process. The reactor has a vacuum pressure range of 1x10-7 to 1x10-3 Torr. It also has several safety features, such as explosion-proof access to the chamber, emergency air shutoff, and a hot gas bypass pipe. Furthermore, AMAT / APPLIED MATERIALS Producer GT reactor is equipped with an advanced remote access system. This allows for control and monitoring of the reactor from a remote location. The remote access unit also features diagnostics, real-time monitoring, and data logging. This machine is designed to minimize downtime and reduce costs. In summary, AMAT Producer GT is an advanced plasma-enhanced chemical vapor deposition (PECVD) reactor. It features dual-zone control, multi-circle-fuel design, electron cyclotron resonance (ECR) technology, and advanced remote access tool. This reactor is designed to achieve faster deposition rates and higher uniformity in material films and coatings. It is ideal for materials processing applications that require high temperatures and precise process control.