Used AMAT / APPLIED MATERIALS Producer GT #9284083 for sale
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ID: 9284083
Wafer Size: 12"
Vintage: 2015
CVD System, 12"
Process: Frontier nitride poly etcher
Factory interface: (3) FOUPs
Handler: Standard automation
(3) Chambers:
Chamber A: SiCoNi PME
Chamber B and C: Frontier SMR Poly
2015 vintage.
AMAT / APPLIED MATERIALS Producer GT is an advanced etch reactor designed for semiconductor silicon-on-insulator (SOI) advanced process integration. This version of AMAT Producer GT has been designed with industry-leading feature sizes, superior uniformity and best-in-class latency. Additionally, this reactor features the industry's first multi-chamber configuration and is specifically designed for a broad range of customer requirements. APPLIED MATERIALS Producer GT reactor is equipped with an advanced PECVD gas delivery system and is capable of delivering silicon oxynitride, silicon nitride and other dielectric materials at high PECVD rates. The reactor also has a Plasma Enhanced Layer Deposition (PELD) capability to create thin planarized dielectric layers and the ability to perform chemical-mechanical polish (CMP) processes. The CMP processes provide a planar non-volatile dielectric layer with excellent properties for device performance. Producer GT reactor also features a high-throughput valve system which enables rapid switching between chamber states, reducing process time. Additionally, the uniformity of the reactor's uniformity allows for the integration of different process modules. The reactor also offers long-range uniformity control, providing precise process control throughout a large process area. AMAT / APPLIED MATERIALS Producer GT also offers a broad range of process control features, including automatic process tuning, self-learning capability and 'lock-in' mode. With this technology, process control is narrowed down to a finer level, enabling higher productivity and product quality without sacrificing yield and cycle time. Overall, AMAT Producer GT is an innovative reactor that combines high performance and reliability with a flexible and cost-effective platform. It offers superior process control and is capable of achieving leading device performance in advanced process integration.
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