Used AMAT / APPLIED MATERIALS Producer GT #9294490 for sale
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ID: 9294490
CVD System, 12"
With (2) twin chambers
Wafer shape: SNNF
Local Center Finder (LCF)
Transfer robot type: GT
Load lock chamber pump type: EPX TWIN 180L
Hard Disk Drive (HDD)
(2) Heaters of FCVD chamber missing
EFEM Chamber with FZ
MKS Astron ex BPSG Chamber
FCVD Chamber
Transfer chamber: 30 mm
Ozone rack
AC Distribution box
(4) Chillers:
THERMO FISHER SCIENTIFIC MX 500W D3
(2) SMC INR–498–012D–X007
SMC INR–496–002D–X007
System rack
(9) Boxes
Frame
PC
Monitor
SMIF/FI:
Type: 5.4
AMHS: OHT
Pre-alignment
Pass through and storage: 8-Slots wafer pass through
(2) Load ports (1 and 4 positions)
FI Controller type:
FE, FI and RT Computer type: IBM 306M
Sub components:
O3 Generator type: MKS ASTEX
Ozone cabinet: INUSA
Heat exchanger type: SMC H2000
Heat exchanger type for O3: MX500
(2) Chambers:
Chamber A:
Type: FCVD Twin
Process: F-Oxide
Heater lift driver: 0190-13840
Isolation (Gate) valve: Nor Cal 041010-1
Throttle valve: MKS T3Bi
RPS Type: MKS Astron e/ex
Manometer: 5 Torr / 100 Torr
Chamber B:
Type: SACVD Twin
Process: HARP USG
Heater lift driver: 1080-00126
Isolation (Gate) valve: Nor Cal 021010-1
Throttle valve: MKS 683
RPS Type: MKS Astron EX
Manometer: 20 Torr / 1000 Torr
Process chamber:
Gas box
Face plate
Blocker plate
Input manifold
Output manifold
Teflon manifold
Ceramic isolator
Heater
RF Filter
Pin lift driver
AC Box
Gas delivery:
Gas pallet type
Regulator
Transducer
Gas pallet configuration:
Chamber A:
Stick position / Gas type / Volume
1 / N2 Purge / -
2 / NF3 / 10 SLM
3 / AR / 10 SLM
4 / N2 / 200 SCCM
5 / O2 / 2.5 SLM
6 / N2 Purge / -
7 / Si3H9N / 1 L
9 / HE / 5 SLM
10 / N2 Purge / -
11 / NH3 / 700 SCCM
12 / NH3 / 1 SLM
14 / H2O / 1g/min
15 / AR / 5 SLM
21 / HE / 5 SLM
22 / N2 Purge / -
Chamber B:
Stick position / Gas type / Volume
1 / N2 Purge / -
2 / NF3 / 7 SLM
3 / AR / 15 SLM
4 / N2 / 5 SLM
5 / N2 / 10 SLM
6 / O3 Out / -
7 / O3 In / -
8 / O2 / 30 SLM
9 / N2 / 30 SLM
10 / H2O In / 10g/min
11 / H2O Out / -
14 / TEOS / 7g/min
15 / N2 / 50 SLM
21 / HE / 3 SLM
22 / N2 Purge / -
Power supply:
Remote AC line: 208 V, 50/60 Hz
Remote UPS
2009 vintage.
AMAT / APPLIED MATERIALS Producer GT is a tool for the deposition of thin films of materials or materials combinations onto substrates. The equipment consists of a three-chamber reactor, a series of pumps and controllers, and an advanced thermal management system. This complete unit is designed to allow precise deposition of materials onto substrates. The main chamber of the reactor holds the substrate, while the other two smaller chambers hold the materials to be deposited. The machine uses a variety of techniques to deposit materials onto the substrate, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and sputtering. The powerful thermal management tool allows the materials to be heated and cooled appropriately for each deposition technique. The substrates are loaded into the main deposition chamber of the reactor, along with the materials to be deposited. The materials are heated to the appropriate temperature, and then fed into the chamber through the smaller chambers. The gases and vapors produced by the decomposition of the materials are drawn away through the exhaust line. As the vapors and gases move away, the substrate is slowly covered in the desired thin film of material combination. The asset is highly customizable, allowing users to adjust parameters such as temperature, pressure, and gas flow rate to fine-tune their deposited material. The customizability of AMAT Producer GT gives users the ability to achieve precise deposition of materials on a range of substrates, allowing for the fabrication of complex electronic devices. APPLIED MATERIALS Producer GT is an all-in-one tool designed to make deposition of thin films of materials simple and precise. With its robust thermal management model, customizable parameters, and wide range of deposition techniques, Producer GT is a reliable and efficient tool for modern electronics fabrication.
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