Used AMAT / APPLIED MATERIALS Producer GT #9296911 for sale

AMAT / APPLIED MATERIALS Producer GT reactor is an advanced processing equipment developed by AMAT to provide higher production yields in the semiconductor fabrication process. The reactor combines gas delivery, thermal management and applied plasma technologies to create an integrated solution for controlling Si-based etch processes. At the core of AMAT Producer GT reactor is its multi-gas delivery. The reactor is capable of supplying up to eight different gases, enabling its use in multi-step etch processes that involve the sequential or simultaneous delivery of fluorine containing, noble, dopant, and other reactive species. By utilizing Advanced Mass Flow Controllers (AMFCs), it is possible to achieve superior uniformity and repeatability across the entire substrate. Furthermore, the advanced software architecture of APPLIED MATERIALS Producer GT reactor allows for precise control over parameters such as plasma power, process recipe, etc. Producer GT reactor also features integrated thermal management, allowing for not only improved process control but also enhanced energy efficiency. Its advanced positioning system features active optical alignment and extended substrate support, making it suitable for substrates of varying sizes and configurations. Its liquid and fast-cycling temperature control systems are designed to provide superior temperature uniformity across the substrate and for the entire reactor chamber, preventing faceting issues and allowing for longer runs at higher process speeds. In terms of its applied plasma technology, AMAT / APPLIED MATERIALS Producer GT reactor is built on the company's proven electron cyclotron resonance (ECR) source. This allows the reactor to achieve higher power density levels, leading to improved etching rates and better film uniformity. Furthermore, the ECR source also provides improved rare-gas efficiency, improving processing while reducing wafer-level defects. AMAT Producer GT reactor is a highly advanced and versatile etching unit that is ideal for semiconductor research and production. With its advanced hardware and software capabilities, the reactor is capable of achieving not only higher production yields, but also improved process repeatability and uniformity. The machine's integrated thermal management capabilities also ensures improved energy efficiency, resulting in reduced carbon emissions.