Used AMAT / APPLIED MATERIALS Producer GT #9351133 for sale

AMAT / APPLIED MATERIALS Producer GT is an advanced plasma enhanced chemical vapor deposition (PECVD) reactor used for deposition of dielectrics, polymers, and metals. It is designed to increase production capacity and reliability, deliver improved product quality, and reduce operational costs. AMAT Producer GT reactor equipment combines a source chamber, deposition chamber and fully automated process chamber controllers, a gas line cabinet, heating zone controls, a central vacuum system, and an in-situ endpoint measurement (IEM) unit as a complete solution. The reactor is incredibly flexible and can be used to process a wide range of materials from large area substrates down to micron-sized features. The source chamber of APPLIED MATERIALS Producer GT is equipped with several integrated high-power RF sources to give high deposition rates. The gas injection machine is designed to deliver precise fuel mixture ratios for control over deposition rate and interface limit control. Multiple gas lines and digital mass flow controllers allow for complex processes, such as simultaneously running reactive and inert gas chemistries. The reactor chamber is designed to provide uniformity and repeatability to the deposition process with a very small source-to-substrate distance for excellent process control. A linear-field electromagnetic coil provides high uniformity over a large area. It also has an impressive temperature control mechanism integrated to deliver high temperature uniformity with separate heating zones and direct temperature feedback. The IEM tool is the ultimate control for substrate deposition, monitoring in-situ process endpoints and providing real-time feedback. This monitoring asset is capable of detecting any deposition rate variations with high sensitivity over a large range of temperatures. The IEM model also has an integrated deposition process chamber atmosphere monitoring equipment for every process chamber allowed. Overall, Producer GT is a reliable, automated PECVD system that is capable of delivering precise process control and deposition uniformity over wide areas with incredibly fast deposition rates. This reactor unit is an attractive option for any scientist or engineer requiring high performance and precision in their deposition process.