Used AMAT / APPLIED MATERIALS Producer GT #9399904 for sale

AMAT / APPLIED MATERIALS Producer GT
ID: 9399904
Vintage: 2014
CVD System 2014 vintage.
AMAT/AMAT / APPLIED MATERIALS Producer GT is a high-performance reactor designed for state-of-the-art CVD processes. It delivers a wide range of substrates and materials with excellent uniformity and productivity. The reactor features a batch-mode carbon source with optional quartz liner, enabling more productivity and greater uniformity throughout the process. The equipment also features a low thermal mass tube design, allowing for a more uniform temperature profile. A precisely adjustable radial distribution manifold ensures uniform deposition of materials across the cycle, leading to improved product yields. AMAT Producer GT also offers several advanced features, such as high pressure in-situ gas mixing, allowing several gases to be processed in a single run. This helps reduce gas pressures, increase mass throughput and improve material uniformity. The reactor is also capable of high temperature deposition and is continuously monitoring the process conditions through its temperature archiving system. The unit includes an automated process control loop which along with the advanced in-situ gas mixing significantly improves process repeatability and reliability. APPLIED MATERIALS Producer GT also utilizes a specialized suite of control software and safety systems. These control systems actively monitor the process conditions and are designed to ensure the safety of operators and equipment. The DeltaV automation machine includes process control, recipe management, closed-loop control and batch management software. It also includes integrated process data logging and reporting capabilities, providing operators with real-time information on process performance. Overall, APPLIED MATERIALS/Producer GT reactor is an advanced CVD process tool that provides flexibility, repeatability and reliability, helping to improve device quality and production yields. The tool's features and technology make it a leader in the field of CVD processes. It is an ideal tool for developing and production-level semiconductor processes.
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