Used AMAT / APPLIED MATERIALS Producer GT3 #293610776 for sale

AMAT / APPLIED MATERIALS Producer GT3 is a leading-edge PECVD (plasma-enhanced chemical vapor deposition) reactor. It is widely used in the semiconductor industry for depositing dielectric and metal layers onto silicon wafers. It is also utilized for other applications such as Solar PV, medical device and sophisticated electronics. AMAT Producer GT3 is an efficient and versatile tool. It features a modular design with two chambers, a source chamber and a reaction chamber. This arrangement separates precursory gas and plasma processing from the deposition process. The reactor is capable of both low-pressure and atmospheric pressure process chemistries, allowing for a wide range of deposition rates and plasma conditions. It is designed to be compliant with temperature, pressure and gas flow monitoring, ensuring precise control and consistent results. APPLIED MATERIALS Producer GT3 is equipped with a high-density magnetron and a dielectric cooling plasma source. This advanced design provides improved uniformity, repeatability and deposition quality. In addition, it gives the reactor the ability to handle large substrate sizes. The high-temperature ceramic liner and top-mounted heaters produces high quality nitrides and oxides, making it a great choice for deep UV and high Q dielectric systems. It also provides a clean operating environment for sensitive metals and other electronics architectures. Producer GT3 is capable of carrying out several deposition processes. It is used for an extensive range of processes including metallizing, CVD, PVD (Physical Vapor Deposition), ALD (Atomic Layer Deposition) and MOCVD (Metalorganic Chemical Vapor Deposition). The reactor is capable of achieving film thicknesses ranging from 10 nm to over 5 microns, making it a great choice for advanced device fabrication. AMAT / APPLIED MATERIALS Producer GT3 is also capable of carrying out a wide range of thermal processes, including rapid thermal annealing and rapid thermal processing. It is ideal for annealing photoresists to improve the throughput and process reliability. Furthermore, its high temperature capability ensures good wafer contact and homogeneous film growth. In conclusion, AMAT Producer GT3 PECVD reactor is a powerful and versatile tool. It has a wide range of applications, including deposition of dielectric and metal layers as well as several other advanced processes. It is an efficient tool, providing precise control and consistent results. It is a great choice for making advanced electronic devices.