Used AMAT / APPLIED MATERIALS Producer III #9091079 for sale

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Manufacturer
AMAT / APPLIED MATERIALS
Model
Producer III
ID: 9091079
SACVD System, 8" (2) Twin chambers, RPC clean Platform: Split SACVD: TEOS, TEB, TEPO process SiO2, PSG, BPSG RPC Chamber Clean: MKS ASTRON-2L 4 color signal tower: (Red-Yellow-Green-Blue) Mainframe Seriplex BD: 0090-00475 Rev-P1 MF Interface BD: 0100-00752 Rev-003 Cassette Loader: PRI Robot: Front End Manual Type 200mm: ATM407B-1-S Brooks Auto PRI Robot Controller: ESC-200-OTF-110: CTL-27900 Filter Assy: MAC10ULPA 11057002 Load-Lock Chamber: Index Motor Driver: 5-Phase UDK5128NW2 Left Loadlock: 6 Slot / 200mm Right Loadlock: 6 Slot / 200mm Left LL Pressure Gauge: 901P-41-0030 Right LL Pressure Gauge: 901P-41-0030 Pumping Line Pressure Gauge: EDWARD APG-L-NW15 Cassette Door Left: VAT 0750X-UE24-AAL7 / 1522 / A-646946 Cassette Door Right: VAT 0750X-UE24-AAL7 / 1522 / A-646946 Wafer Position Sensor: Keyence PS-55 Buffer Chamber: VHP Robot: VHP Dual Blade Type 200mm VHP Robot Driver: 0190-02472 Rev-001 IPX-100 Pump: missing Purge/Vent MFC: FC-2902 5000 sccm Pressure Gauge: 275 Mini-Convectron Granville-Phillips Chamber A: Chamber Set Interface 0015-00421 Rev-P1 Chamber Seriplex BD 0190-35652 Rev-P1 Heater Type HEATER,CERAMIC,NGK,DIMPLED,COMMON 200 MM HA12(Base: 0040-61269) Heater Material ALN Ceramic Heater Lift Motor Driver 5 Phase UDK5214NW Lid Cover Switch ALCO PUSH Button Heat Exchanger Water Flow Switch Proteus 9AMHXCHP2 / 0015-00649 Rev-001 RF/ OZONE Generator ASTEX 8403A RPS MKS ASTRON-2L Gas Panel Configuration: O2 20L UNIT NF3 3L UNIT Ar 5L UNIT He 10L UNIT N2 20L UNIT TEB 3030-09436 LFM LF-410A-EVD TEB 0.5g/MIN F.S. TEPO 3030-07719 LFM LF-310A-EVD TEPO .25G/MIN F.S. TEOS 3030-07663 LFM LF-410A-EVD TEOS 4G/MIN F.S. TEB Injection Valve 0190-36236 VALVE, INJECTION 208V TEB 120C STEC TEPO/TEOS Injection Valve 0190-36237 VALVE, INJ. 208V TEPO/TEOS 150C STEC Final Filter GLFPF6101VXM4AM In Line Gas Filter WG3NS6RR2 / WFRGD3NF-30 3.31"LG Transducer 852B-13384 : 12ea LDM LDM-B12PA2CC1 : 12ea NF3 Interlock Gauge 41A12DCA2BA050 / 100 Torr Gas Panel I/O Dist GPLI 0100-00259 P4 Gas Panel Seriplex BD 0190-35653 Chamber B: Chamber Set Interface 0015-00421 Rev-P1 Chamber Seriplex BD 0190-35650 Rev-P1 Heater Type HEATER,CERAMIC,NGK,DIMPLED,COMMON 200 MM HA12(Base: 0040-61269) Heater Material ALN Ceramic Heater Lift Motor Driver 5 Phase UDK5214NW Lid Cover Switch ALCO PUSH Button Heat Exchanger Water Flow Switch Proteus 9AMHXCHP2 / 0015-00649 Rev-001 RF/ OZONE Generator ASTEX 8403A RPS MKS ASTRON-2L Gas Panel Configuration: O2 20L UNIT NF3 3L UNIT Ar 5L UNIT He 10L UNIT N2 20L UNIT TEB 3030-09436 LFM LF-410A-EVD TEB 0.5g/MIN F.S. TEPO 3030-07719 LFM LF-310A-EVD TEPO .25G/MIN F.S. TEOS 3030-07663 LFM LF-410A-EVD TEOS 4G/MIN F.S. TEB Injection Valve 0190-36236 VALVE, INJECTION 208V TEB 120C STEC TEPO/TEOS Injection Valve 0190-36237 VALVE, INJ. 208V TEPO/TEOS 150C STEC Final Filter GLFPF6101VXM4AM In Line Gas Filter WG3NS6RR2 / WFRGD3NF-30 3.31"LG Transducer 852B-13384 : 12ea LDM LDM-B12PA2CC1 : 12ea NF3 Interlock Gauge 41A12DCA2BA050 / 100 Torr Gas Panel I/O Dist GPLI 0100-00259 P4 Gas Panel Seriplex BD 0190-35762 VME Controller: #1 SBC BD V452 0090-76133 Rev A #2 Radisys BD Radisys AMAT P133 0660-01857 #3 Unused - #4 Unused - #5 MEI-2 BD 0190-00387 A010-008 Rev 5 #6 Unused - #7 MEI-1 BD 0190-00387 A010-008 Rev 5 #8 Unused - #9 I/O Expansion BD 0090-76040 NT Hard Disk Seagate ST34520N CD-ROM Use NT Floppy Disk 3.5" Legacy Hard Disk 0190-00405 Legacy Floppy Disk 3.5" SCSI FD235HF C700-U 193077C7-00 VME P2 Distribution BD 0100-00430 Loadlock Left Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Loadlock Right Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#A1 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#A2 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#B1 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#B2 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Active Wafer Sensor Keyence PZ2-41 Latest Software Version B3512 Currently de-installed.
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AMAT / APPLIED MATERIALS Producer III is an advanced production reactor used for semiconductor production and purchasing. Its advanced features make it one of the most reliable and efficient production reactors available. AMAT Producer III includes an RF drive, frequency generator, high voltage power supplies, laser scanner, and low voltage power supplies. All of these components work together to optimize production processes, providing improved repeatability and productivity. The RF drive enables high deposition rates with a wide range of process steps, while the frequency generator controls the voltage and power that is provided to the reactor. The laser scanner regulates the amount of material that is deposited on the wafer. APPLIED MATERIALS Producer III provides uniformity in material deposition with an active flow control system that is dynamically adjusted in order to maintain the correct level of material on the wafer. This system also ensures that deposition and etching processes are repeatable. Producer III further includes a pressure monitoring system, which allows for better process control and improved product quality. AMAT / APPLIED MATERIALS Producer III is also designed for high-throughput production and high-temperature processes. Its susceptor has special designs that reduce contamination and allow for quick warm-up times. The susceptor also allows for greater uniformity of material on the wafer. AMAT Producer III is ideal for producing all kinds of materials, whether it's for monolithic wafers, compound semiconductors, or even advanced materials. It can be operated with a variety of gases, ranging from hydrogen to tetrafluoride. It is also designed to be compatible with all types of semiconductor products, so producers know they'll be able to process whatever material their customers need. APPLIED MATERIALS Producer III is compliant with all industry standards, offering users improved reliability and first-rate performance. It includes a comprehensive set of safety features that protect operators and ensure that any process is as efficient as possible. Its features also offer manufacturers the capability to meet all their production requirements. Producer III is a highly reliable and efficient production reactor that will provide users with the production accuracy and repeatability to satisfy their needs. With its ability to process various materials and its flexible and versatile design, it is sure to meet the demands of all types of semiconductor manufacturers. When looking for a production reactor that meets the highest level of performance and reliability, AMAT / APPLIED MATERIALS Producer III is the ideal choice.
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