Used AMAT / APPLIED MATERIALS Producer III #9092388 for sale
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ID: 9092388
Wafer Size: 12"
Vintage: 2001
BPSG System, 8"
Wafer shape: SNNF
Mainframe: Producer Split
SMIF: manual
Ozone generator: Astex
System controller UPS option: no
(2) Chambers: BPSG
Heater: ceramic
Clean method: remote plasma
Manometer: Dual 20/100 Torr
Chamber wall: 11.484 o-ring
Gas Delivery
MFC type: Unit 8160
Valves: Fujikin 5 Ra Max
Filters: Pall
Transducer: MKS w/o display
Regulators: Parker
O2 20L UNIT
NF3 3L UNIT
Ar 5L UNIT
He 10L UNIT
N2 20L UNIT
TEOS STEC
TEPO STEC
TEB STEC
Electrical requirements: 200/208V, 50/60Hz, 240A
2001 vintage.
AMAT / APPLIED MATERIALS Producer III is a high-performance, high-throughput, multi-process reactor engineered to provide a range of film and device applications. It features an advanced, patented three-zone design, allowing for accurate process setting and excellent uniformity in fabrication. The reactor has an automated, two-axis positioner, which facilitates improved process control and uniformity across the entire area of interest. Additionally, the self-adjusting support shaft and adjustable tilt angles offer further flexibility for processing. The individual gas and process control valves offer precise adjustment and independent operation, while the integrated equipment temperature management further adds to process stability. Additionally, the state-of-the-art control system provides the tool's versatility and ease-of-use operations. This advanced reactor also features a novel electrode-to-fixture locking alignment unit that ensures maximum stability and accuracy in the reaction chamber during fabrication. Additionally, the closed-loop control and temperature management machine enables the reactor to reach desired temperatures quickly and accurately. The integrated diagnostics and maintenance tool, providing real-time capability, further ensures maximum process efficiency with minimal downtime. The clean chamber design ensures a contamination-free production process, making the reactor suitable for a range of applications in semiconductor, thin-film, optoelectronic, chemical-mechanical, and vacuum processing. It also supports multiple applications that benefit from high uniformity and high throughput capabilities. These include metal deposition, etching, oxidation, silicon nitridation, silicon oxy-nitridation, BPSG deposition, SiO2 deposition and passivation, evaporative thin-film processing, nitride deposition, thermal oxidation, and molecular-beam epitaxy (MBE). In summary, AMAT Producer III is a reliable and versatile reactor, capable of providing accurate and high-throughput fabrication for a variety of thin-film, optoelectronic, and process applications. It features an advanced, three-zone design, two-axis positioner, adjustable tilt angles, integrated temperature management, and a closed-loop control asset, making it an ideal choice for fabrication professionals.
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