Used AMAT / APPLIED MATERIALS Producer III #9209863 for sale

AMAT / APPLIED MATERIALS Producer III is a high-performance PECVD (Plasma Enhanced Chemical Vapor Deposition) tool designed for advanced semiconductor device fabrication. It is capable of depositing thin films of dielectric, metal, nitride, and other materials onto semiconductor substrates. AMAT Producer III equipment features a dual-chamber design, allowing for highly efficient multilayer deposition processes. The first chamber contains the substrate loadlock and the are chambers. The second chamber houses the plasma chamber and its user-defined magnetron sources, enabling precise control of the layer thickness and uniformity. The system operates in accordance with a programmable logic controller for high yield and uniform deposition. It boasts high rates of production and can be configured for up to five different substrates. The unit utilizes two electron cyclotron resonance (ECR) or RF plasma sources in order to obtain higher deposition rate and uniformity. The RF sources allow for a wide range of process parameters to be adjusted, including; RF frequency, RF power, bias voltage and pressure. Furthermore, the ECR plasma sources enable extremely high deposition rates, while maintaining a uniform and smooth film structure. The machine also offers a real time controller with monitoring of chamber pressures, temperatures, and stress control. It also allows for precise control of the reactant gas concentration and flow rates. APPLIED MATERIALS Producer III is designed with a host of safety features for reliable operation, including a 24/7 monitoring tool which will shut down the tool in case of any potential danger. The tool also features a programmable interlock asset to ensure safe operation, while the temperature and pressure sensors help maintain process control. Contamination control is kept extremely low, thanks to the high-efficiency filtration model. Furthermore, the equipment can be remotely monitored, allowing users to make adjustments quickly and conveniently. All in all, Producer III is a highly efficient and reliable PECVD system equipped with numerous features and safety systems. Thanks to its dual-chamber design and RF and ECR plasma source control, it is capable of depositing highly uniform and smooth layers of various materials onto substrates. It is a great choice for semiconductor device fabrication, due to its high deposition rate and excellent yield.