Used AMAT / APPLIED MATERIALS Producer III #9223072 for sale

AMAT / APPLIED MATERIALS Producer III is a complete production-scale advanced semiconductor deposition/etch reactor. It has been designed to meet the most demanding needs of the semiconductor industry with superior performance and adaptation. This reactor is composed of a number of components, each playing an important part in the intricate manufacturing process. The power supply of AMAT Producer III is modular and allows for flexibility in the choice of materials being processed. It is capable of continuously, accurately, and reliably controlling the reactive gas flow during etching and deposition steps. The multiple gas box design allows independent control of each gas blend for maximum efficiency, productivity, and repeatability. The chemical delivery system provides precise control over the flow rate, mix, and composition of the reactive gases for the production process. This allows for extreme control over the layers of film created through the deposition processes. It also helps to ensure the highest level of repeatability for critical semiconductor layers. A combination of thermal and chemical cleaning systems also enable APPLIED MATERIALS Producer III to achieve higher levels of cleanliness than traditional reactors. The sputtering system on Producer III is capable of uniform thin film deposition at high production speeds while maintaining the highest level of quality. This system allows for the deposition of several films with different stoichiometric composition on the sample. It is also capable of varying the thickness of the films depending on the intended application. AMAT / APPLIED MATERIALS Producer III is triggered by molybdenum heaters, microprocessor temperature enablement, and a wide range of control furnaces. This offers the highest level of performance and productivity. Additionally, AMAT Producer III also features a full-color touch-screen, auto-tune capability, and advanced process monitoring. Overall, APPLIED MATERIALS Producer III advanced semiconductor deposition/etch reactor is a powerful, reliable, and efficient solution for fabrication and research labs. It provides all the necessary capabilities needed for consistent production and top-tier quality.