Used AMAT / APPLIED MATERIALS Producer III #9240095 for sale

ID: 9240095
Wafer Size: 8"
Vintage: 2004
CVD System, 8" (3) Twin chambers Platform: Producer S Wafer shape: SNNF Load lock: Cassette type, 8" Fast vent option Mainframe: Buffer robot type: VHP FI Robot type: Manual Buffer robot blade Chamber A: Producer APF Chamber B: Producer DARC Chamber C: Producer SAUSG (2) Heater exchangers: Steelhead 0 Chiller MX-500 O3 Rack Front end type: Manual Front end robot: PRI BROOKS ABM407 Buffer robot: VHP Transfer pump: IPX Pump Chamber slit valve / LL Door: VAT L/L Gauge Hard disk Floppy disk: 1.44 M Chamber A: (APF) Chamber parts: Gas feedthrough assy Gas box Face plate Heater / TC: OEM Pressure gauge: MKS 20 Torr / MKS 100 Torr RF Power: RF Generator: ADVANCED ENERGY 2000-2 V Match type: ADVANCED ENERGY Fixed match Gas panel: C3H6, Ar, He, O2 Vacuum system: Throttle valve: MKS 253B-24627 ISO Valve: MKS Chamber B: (DARC) Chamber parts: Gas feedthrough assy Gas box Face plate Heater / TC: OEM Pressure gauge: MKS 100 Torr / MKS 10 Torr RF Power: RF Generator: ADVANCED ENERGY 2000 - 2 V Match type: ADVANCED ENERGY Fixed match RPS Type: MKS ASTEX Gas panel: CO2, N2O, He, NF3, SIH4 Vacuum system: Throttle valve: MKS 253B-24627 ISO Valve: MKS Chamber C: (SAUSG) Chamber parts: Gas feedthrough assy Gas box Face plate Heater / TC: OEM Pressure gauge: MKS 20 Torr / MKS 1000 Torr RF Power: No RF generator No match RPS Type: (MKS ASTEX) Gas panel: O2, NF3, Ar, He, O3, TEOS Vacuum system: Throttle valve ISO Valve Light tower: RYGB Power: 208 V, 50/60 Hz Full load current: 240 A CE Marked 2004 vintage.
AMAT / APPLIED MATERIALS Producer III Reactor is a manufacturing machine that is designed to produce substrates at high temperatures. It is an advanced reactor that is intended for processing semiconductors, hard materials, and tribological materials. The reactor is primarily used for semiconductor research, production, and automation testing. The reactor is composed of three chambers that operate at separate temperatures: the first chamber is designed to reach up to 2000°C, the second chamber is programmed to reach up to 1000°C, and the third chamber is capable of reaching up to 500°C. The reactor is also equipped with a gate valve which adjusts pressure in the chamber. The Producers III Reactor is equipped with an advanced cooling equipment that cools all three chambers simultaneously. This cooling system is designed to reduce the time it takes to start up the reactor and prevent thermal runaway from occurring. The Producers III Reactor has advanced safety features including a failsafe unit, multiple safety interlocks, and an emergency shut down. The reactor also has an electrostatic containment machine which isolates the reactor from the outside environment. The reactor is also designed to process materials efficiently by using the ID AMAT proprietary deposition tool which sprays a steady, uniform film of material onto the substrate. This deposition asset is capable of reaching the desired temperatures quickly and efficiently. This highly advanced reactor is capable of performing a wide range of processes such as nitridation, oxidation, rapid thermal processing, and deposition. AMAT Producer III Reactor is a versatile and efficient tool that is used in the semiconductor industry to produce substrates.
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