Used AMAT / APPLIED MATERIALS Producer III #9240095 for sale
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ID: 9240095
Wafer Size: 8"
Vintage: 2004
CVD System, 8"
(3) Twin chambers
Platform: Producer S
Wafer shape: SNNF
Load lock:
Cassette type, 8"
Fast vent option
Mainframe:
Buffer robot type: VHP
FI Robot type: Manual
Buffer robot blade
Chamber A: Producer APF
Chamber B: Producer DARC
Chamber C: Producer SAUSG
(2) Heater exchangers: Steelhead 0
Chiller MX-500
O3 Rack
Front end type: Manual
Front end robot: PRI BROOKS ABM407
Buffer robot: VHP
Transfer pump: IPX Pump
Chamber slit valve / LL Door: VAT
L/L Gauge
Hard disk
Floppy disk: 1.44 M
Chamber A: (APF)
Chamber parts:
Gas feedthrough assy
Gas box
Face plate
Heater / TC: OEM
Pressure gauge: MKS 20 Torr / MKS 100 Torr
RF Power:
RF Generator: ADVANCED ENERGY 2000-2 V
Match type: ADVANCED ENERGY Fixed match
Gas panel: C3H6, Ar, He, O2
Vacuum system:
Throttle valve: MKS 253B-24627
ISO Valve: MKS
Chamber B: (DARC)
Chamber parts:
Gas feedthrough assy
Gas box
Face plate
Heater / TC: OEM
Pressure gauge: MKS 100 Torr / MKS 10 Torr
RF Power:
RF Generator: ADVANCED ENERGY 2000 - 2 V
Match type: ADVANCED ENERGY Fixed match
RPS Type: MKS ASTEX
Gas panel: CO2, N2O, He, NF3, SIH4
Vacuum system:
Throttle valve: MKS 253B-24627
ISO Valve: MKS
Chamber C: (SAUSG)
Chamber parts:
Gas feedthrough assy
Gas box
Face plate
Heater / TC: OEM
Pressure gauge: MKS 20 Torr / MKS 1000 Torr
RF Power:
No RF generator
No match
RPS Type: (MKS ASTEX)
Gas panel: O2, NF3, Ar, He, O3, TEOS
Vacuum system:
Throttle valve
ISO Valve
Light tower: RYGB
Power: 208 V, 50/60 Hz
Full load current: 240 A
CE Marked
2004 vintage.
AMAT / APPLIED MATERIALS Producer III Reactor is a manufacturing machine that is designed to produce substrates at high temperatures. It is an advanced reactor that is intended for processing semiconductors, hard materials, and tribological materials. The reactor is primarily used for semiconductor research, production, and automation testing. The reactor is composed of three chambers that operate at separate temperatures: the first chamber is designed to reach up to 2000°C, the second chamber is programmed to reach up to 1000°C, and the third chamber is capable of reaching up to 500°C. The reactor is also equipped with a gate valve which adjusts pressure in the chamber. The Producers III Reactor is equipped with an advanced cooling equipment that cools all three chambers simultaneously. This cooling system is designed to reduce the time it takes to start up the reactor and prevent thermal runaway from occurring. The Producers III Reactor has advanced safety features including a failsafe unit, multiple safety interlocks, and an emergency shut down. The reactor also has an electrostatic containment machine which isolates the reactor from the outside environment. The reactor is also designed to process materials efficiently by using the ID AMAT proprietary deposition tool which sprays a steady, uniform film of material onto the substrate. This deposition asset is capable of reaching the desired temperatures quickly and efficiently. This highly advanced reactor is capable of performing a wide range of processes such as nitridation, oxidation, rapid thermal processing, and deposition. AMAT Producer III Reactor is a versatile and efficient tool that is used in the semiconductor industry to produce substrates.
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