Used AMAT / APPLIED MATERIALS Producer S #9251468 for sale

ID: 9251468
Wafer Size: 8"
Vintage: 2000
CVD System, 8" Shrink type (2) Twin chambers Controller: Legacy type L/L and Xfer pump: EDWARDS IPX Chiller: Steel head AC Box UPS Chamber A and B: Process: P-TEOS (PSG) RF: ADVANCED ENERGY RFG2000-2V LF: ENI QUANTA-10 RPS: ASTRON 2L (F120620-1) Chamber A: Gas panel: Gas / Max flow / Make / Model He / 5 slm / UNIT / UFC-8160 PH3 / 1 slm / UNIT / UFC-8160 NF3 / 3 slm / UNIT / UFC-8160 Ar / 5 slm / UNIT / UFC-8160 O2 / 5 slm / UNIT / UFC-8160 N2O / 2 slm / STEC / SEC-4400 SiF4 / 2 slm / STEC / SEC-4400 TEOS / 4 g/min / STEC / LF-410-EVP TEPO / 0.2 g/min / STEC / LF-310A-EVP Chamber B: Gas panel: Gas / Max flow / Maker / Model He / 5 slm / UNIT / UFC-8160 PH3 / 1 slm / UNIT / UFC-8160 NF3 / 1 slm / UNIT / UFC-8160 Ar / 5 slm / UNIT / UFC-8160 O2 / 5 slm / UNIT / UFC-8160 TEOS / 4 g/min / ST EC / LF-410A-EVP TEPO / 0.2 g/min / STEC / LF-310A-EVP 2000 vintage.
AMAT / APPLIED MATERIALS Producer S is a spin-on deposition (SOD) reactor designed for the production of IC devices and other components. It can be used for high-volume production of integrated circuits, MEMS devices, and other optoelectronic components. AMAT PRODUCERS reactor is specifically designed to provide a wide range of temperatures, pressures, and gas flows, allowing users to achieve optimized process conditions for a range of materials. APPLIED MATERIALS PRODUCER-S reactor features an advanced high-throughput cluster equipment that enables continuous operation from start to end of the device fabrication process while providing uniform and repeatable imaging results. The S reactor is equipped with a dual-row gas injector and a low-flow mixing system, which improve both temperature and pressure control for precise deposition of thin films. It also has an integrated temperature monitoring and control unit for achieving superior thin film deposition. The machine consists of a heated ID chamber, a heating element of selectable temperature, a convection plenum, and a vacuum pump to maintain the desired pressures. The S reactor is designed to ensure high levels of productivity and yield while maintaining tight control of process parameters. It can be used for advanced IC device production, including 3D structures, that require deposition of material with precise uniformity and repeatability. The control tool uses an ASCODE mapping algorithm to ensure that all process conditions are maintained throughout the entire run. The asset also includes a software-enabled feedback loop to control the reactor's operation. AMAT PRODUCER-S reactor is a powerful and reliable tool for the fabrication of IC devices and other components with high throughput, low cost of ownership, and excellent process control. The model is capable of producing high-quality ICs at a low cost of ownership due to its low cost of acquisition and operation. It is also well suited for use in research and development, as well as large-scale fabrication of components for commercial applications.
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