Used AMAT / APPLIED MATERIALS Producer S #9291526 for sale

AMAT / APPLIED MATERIALS Producer S is an advanced process chamber equipment used in the manufacture of integrated circuits and other semiconductor components. It is a high-temperature chemical vapor deposition (CVD) reactor which allows the production of high volumes of built-in electronics. AMAT PRODUCERS is a multi-functional system suitable for a range of post-processing applications, including CVD, atomic layer deposition (ALD), and physical vapor deposition (PVD). APPLIED MATERIALS PRODUCER-S has a symmetrical ceramic chamber design which creates an ideal environment for the deposition of polymers, oxides, and metals. It can be operated in temperatures up to 1000°C in a nitrogen or oxygen environment and the chamber is designed for uniform film thickness and heat control. The chamber also has an integrated microwave plasma source designed to preserve the quality and consistency of the films being deposited. AMAT Producer S is equipped with a robotized end-effector unit and a collection of gas controls which can be precisely dialed in for desired processes. The multiple in-situ diagnostic capabilities, including an optical emission spectrometer (OES), analyze material deposition and optimize film performance in various processes. An additional option of an angled substrate heater is available to facilitate films with greater uniformity. All of the components are housed in a single enclosure and can be accessed through its modular design, allowing for fast and efficient maintenance. The machine is also equipped with intuitive software and user-friendly features. It facilitates access to real-time process data, predictive modeling, and process optimization capabilities. Operating parameters can be quickly modified and adjusted in order to achieve desired results. The integrated software also allows for remote access, providing increased flexibility and monitoring capabilities. AMAT / APPLIED MATERIALS PRODUCER-S is a robust and highly-capable CVD tool, offering superior quality and high throughput for a range of post-processing applications. Its symmetrical ceramic chamber design enables uniform deposition of polymers, oxides, and metals, providing a controlled environment for the high-temperature chemical vapor deposition process. The improved gas mixing capabilities and multiple in-situ diagnostics ensure material deposition is consistent and of good quality, helping to minimize scrap losses. Its modular design and intuitive software also offer real-time monitoring, making it an ideal choice for integrated circuit manufacturing.