Used AMAT / APPLIED MATERIALS Producer S #9296926 for sale

AMAT / APPLIED MATERIALS Producer S is a multi-chamber, split-type reaction system that enables a variety of industrial processes, including semiconductor device manufacture, nanowire deposition, thin film deposition, and photovoltaics. The reactor consists of three chambers: a pre-evacuation chamber, an ultra-high vacuum chamber, and a loadlock chamber. The layout can easily be adapted for different applications, with the entire system capable of fitting into a single benchtop space of less than 10ft(3m). The pre-evacuation chamber is used to pump down the pressure of the loadlock chamber and the ultra-high vacuum chamber. It also serves to introduce low temperature vacuum to facilitate deposition. The loadlock chamber is designed to allow loading of substrate holders into the ultra-high vacuum chamber without breaking vacuum, so that the ultra-high vacuum can be maintained. The loadlock chamber is heated to approximately 85 degrees Celsius, aiding in substrate desorption and reducing particle generation. The ultra-high vacuum chamber is capable of reaching pressures of up to 2x10-7torr. This chamber is where the actual deposition would take place. The reaction chamber is equipped with a shielded quartz coldwall viewport, a gas manifold, an electrical feedthrough, high-intensity lamps, and a container to ionize the atmosphere. This chamber is designed to accept different types of holders, such as wafer holders and substrate holders, to enable substrate manipulation and deposition. AMAT PRODUCERS enables various advanced technologies, including plasma-enhanced chemical vapor deposition (PEVCD), chemical vapor deposition (CVD), and sputtering. These processes facilitate thin film deposition on silicon wafers and substrates, creation of nanoparticles and nanostructures, and deposition of metallic, semiconductor, and dielectric films. Overall, APPLIED MATERIALS PRODUCER-S is a highly versatile reactor capable of a wide range of industrial processes in a single, space-saving design. The configuration enables processor to achieve the pressures, temperatures, and vacuum levels required for advanced manufacturing processes while maintaining a safe and reliable system.