Used AMAT / APPLIED MATERIALS Producer SE APF #293649954 for sale

ID: 293649954
Wafer Size: 12"
CVD System, 12" Transfer chamber Loader AC Rack.
AMAT / APPLIED MATERIALS Producer SE APF is a revolutionary reactor designed for atomic layer deposition (ALD) processes. It is a highly efficient, full-featured system for semiconductor manufacturing and other device fabrication. AMAT Producer SE APF reactor is capable of producing uniform and conformal layers with sub-nanometer accuracy and repeatability. The reactor is a single-wafer processing system with an embedded plasma source and uniform deposition across a wafer. It includes an ultra-high density plasma source, automated precision controls and a vacuum chamber. The ultra-high density plasma source is used for advanced material deposition and etching applications. It provides high power density, high energy plasma that provides process control and excellent uniformity. It also features a high-resolution digital plasma control for precision control over material deposition and etching. The integrated source allows for on-raise uniform processing area with unprecedented deposition accuracy. The automated precision controls include an intelligent controller that can precisely control the process parameters. This allows for consistent, repeatable results regardless of sample or wafer size. APPLIED MATERIALS Producer SE APF reactor also includes a sophisticated user interface and an advanced control system that allow for optimization of process parameters at each step of the deposition and etching processes. The vacuum chamber is constructed with ultra-precision machined metal and a high-quality quartz optical window. It offers excellent resistance to thermal expansion, corrosion due to aggressive chemicals, and contamination. The chamber allows for complete automation of the deposition and etching processes, and allows for higher throughput with minimal contamination. This high-performance reactor offers ultra-precise deposition and etching for semiconductor industries. The high-resolution digital plasma control enables fabrication processes of advanced materials with accuracy and repeatability. The integrated source provides uniform deposition across the wafer, and the automated precision controls allow for optimization of the process parameters. With all these features, Producer SE APF reactor is an excellent choice for device fabrication.
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