Used AMAT / APPLIED MATERIALS Producer SE #293614953 for sale

AMAT / APPLIED MATERIALS Producer SE
ID: 293614953
Vintage: 2007
CVD System 2007 vintage.
AMAT / APPLIED MATERIALS Producer SE (Plasma Enhanced Chemical Vapor Deposition) is an innovative new type of reactor designed to produce high-quality materials in a cost-efficient and time-saving manner. The reactor utilizes the process of Plasma Enhanced Chemical Vapor Deposition (PECVD) to deposit material by breaking down chemically inert gas molecules into reactive plasma atoms and radicals. These atoms and radicals deposit onto the substrate material, resulting in highly advanced material properties. AMAT Producer SE reactor operates in three stages. Firstly, a source gas is introduced into the chamber, which is then ionized to form a plasma. This plasma reacts with the surrounding gas molecules to form reactive atoms and radicals. These atoms and radicals interact with the substrate and form a deposit, which can be material layers, particles, or for integrated circuits and displays. Secondly, a bias voltage is applied to the substrate and it impacts the process of the deposition. Finally, the system adjusts the power levels in the chamber and the substrate to control the growth rate and quality of the material being deposited. APPLIED MATERIALS Producer SE reactor has several advantages over traditional reactors, such as increased throughput, improved uniformity, decreased costs, and increased yields. The increased throughput of the reactor results in improved production rates and shorter processing times. The uniformity of the material deposited is also improved due to the plasma-assisted system, allowing for even and consistent material deposition. Furthermore, the cost-efficiency of the reactor is evident in the reduction of process and materials cost while also conserving time. Finally, the yields of the reactor are enhanced due to the improved deposition process and quality of the deposition process itself. In summary, Producer SE is an innovative new type of reactor that employs the process of Plasma Enhanced Chemical Vapor Deposition (PECVD). The process of production is expedited through the improved throughput and uniformity of the reactor, allowing for faster and cost-effective fabrication. In addition, the yields of the reactor are improved due to the increased deposition quality of the material produced.
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