Used AMAT / APPLIED MATERIALS Producer SE #293636665 for sale

AMAT / APPLIED MATERIALS Producer SE reactor is a state-of-the-art chemical vapor deposition tool used in advanced material processing. It is designed for thin-film deposition applications that require extremely precise control of the deposition process. The equipment is equipped with a patented Dual Layer Film-Control (DLF-C) technology and an advanced digital mixing system to precisely control film properties. The reactor is extremely versatile and can handle a variety of substrate sizes, including 4 inch, 6 inch, 8 inch, and 12 inch. It is capable of depositing thin films of metal oxides, nitrides, oxynitrides, and carbides with excellent uniformity and control over film thickness and composition. In addition, the unit has an advanced digital gas mixing interface that allows for precise control of chamber flow and pressure conditions. This enables the deposition of films with optimized chemical and physical properties. The gas distributions are monitored using a suite of advanced monitoring systems located within the process chamber and on the machine console. Other features include advanced remote control capabilities that are accessible through a suite of automated programming options. These allow for automated tool setup and monitoring. The asset can also provide up to two-stage flow for deposition of sub-layers without pressure perturbations, allowing for exceptional homogeneity in films deposited on large- and small-sized wafers. The model is powered by an easy-to-use, self-contained graphical user interface which allows for quick and efficient equipment setup and data analysis. The system also allows users to integrate process data, so that the results can be used for in-depth analytical studies. AMAT Producer SE reactor is a highly customizable and powerful tool for advanced material processing. Its advanced digital gas mixing technology, precision control of the deposition process, two-stage flow, automated unit setup, and integrated data analysis make it an ideal choice for advanced thin-film deposition applications.