Used AMAT / APPLIED MATERIALS Producer SE #9088242 for sale

AMAT / APPLIED MATERIALS Producer SE is a tool for epitaxial deposition of various materials onto semiconductor wafers. It is a vertical-type reactor, which has been designed to operate at low temperatures, ranging from 250 to 500 degrees Celsius. The reactor consists of two main parts, the deposition chamber and the thermal zone. The deposition chamber is where the deposition process takes place. In this chamber, a heated, inert gas is circulated in a specific pattern over the wafer to ensure uniform deposition. The heated gas helps to promote good adhesion between the deposited material and the wafer surface. There are also quartz lamps inside the chamber, which can provide an additional energy boost to further improve the adhesion of the material. The thermal zone is the component of the reactor where material is heated. It is equipped with a single-stage gas heated hot wall crucible, which has a low thermal mass for fast temperature ramping. The hot wall crucible allows the material to be heated in a controlled manner, ensuring precise deposition rate and uniformity. The thermal zone is also equipped with a temperature controller, which facilitates accurate control of the deposition process. AMAT Producer SE reactor is equipped with numerous safety features, such as a furnace interlock equipment, an over-temperature protection device, and an emergency shut-off system. The reactor also has an innovative cooling unit, which helps to maintain the temperature at the desired level. Lastly, the reactor is equipped with a high-quality vacuum machine, which ensures high vacuum levels and a clean operating environment. Overall, APPLIED MATERIALS Producer SE is a highly reliable and efficient tool for epitaxial deposition processes. It offers a wide range of process capabilities and can be used to deposit a variety of materials onto semiconductor wafers. It is equipped with intuitive safety features and a high-quality vacuum tool, and its low temperature operation ensures precise control of the deposition process.