Used AMAT / APPLIED MATERIALS Producer SE #9195324 for sale

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ID: 9195324
CVD System, 12" 2006 vintage.
AMAT / APPLIED MATERIALS Producer SE is a reactor designed for precise thin film deposition applications. It is one of the most advanced reactors on the market and is used to form substrates to create displays, semiconductors, and other devices. The reactor combines innovative process technology with reliable performance, tight process control and good repeatability. Within the reactor, the bell jar and diffusion pump equipment provides superior vacuum and pressure performance and ensures that the exact amount of material is delivered with accurate timing. AMAT Producer SE is equipped with dual zone inerting which provides fast and stable process conditions, allowing for higher quality layers, faster cycle times and lower film contamination. The built-in gas box design allows for efficient sealing of the process chamber and fast reaction times. It has a load lock which efficiently transfers wafers between the load lock chamber and the reaction chamber without exposure to atmosphere, and is capable of accommodating 200mm wafers. In addition, APPLIED MATERIALS Producer SE allows for multimode capability, enabling processing of both reactive and non-reactive gases with the ability to switch from one to the other in a single process step. The control system in Producer SE offers a variety of user-friendly features, such as easy-tailoring recipes, a multi-level security unit and user task-specific wizards. Additionally, the reactor includes a wide range of software tools for monitoring and analyzing the process as well as for creating individual recipes and optimizing performance. With each machine containing a set of standard functions which are based on all AMAT clean processes, the reactor is suitable for both manual and fully-automated operation. AMAT / APPLIED MATERIALS Producer SE reactor is enclosed in a sophisticated vacuum chamber with a 10 liter volume capacity that offers excellent shielding from environmental interference. It features solid state power sources for grid-free pulsed sputtering, uniform and repeatable deposition, and uniform layer thickness on the substrate. Its multi-element wafer stage minimizes the number of motions, increases performance, and optimizes usage of both heating and cooling functions. It is designed for compatibility with APPLIED MATERIALS MaxBright uniformity and deposition control tool, which offers complete process control from start through to finish. Overall, AMAT Producer SE is a reliable, high-performance reactor for thin film deposition applications. With its powerful process capabilities and user-friendly control features, the reactor is well-suited to a variety of deposition needs ranging from simple to highly complex deposition procedures.
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