Used AMAT / APPLIED MATERIALS Producer SE #9198863 for sale
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ID: 9198863
Wafer Size: 12"
Vintage: 2006
CVD System, 12"
Process: BPSG
2 Channels
2006 vintage.
AMAT / APPLIED MATERIALS Producer SE is a high quality PECVD (plasma enhanced chemical vapor deposition) reactor designed for thin film deposition onto large area substrates. This reactor operates at temperatures up to 200°C and features RF (radio frequency) power support for high deposition rate. AMAT Producer SE is a cost-effective and reliable platform for high volume production of complex semiconductor devices such as integrated circuits, Opto-electronics and MEMS (microelectromechanical systems). APPLIED MATERIALS Producer SE has a proprietary gas box design which allows for multiple gas flows into and out of the process chamber. This ensures that the process chemistry is highly accurate, resulting in uniform thin film deposition and high yield outcomes. The dual zone PECVD process chamber is designed to allow for a wide variety of substrate processing configurations, such as both top/bottom and simultaneous/sequential deposition capabilities. This versatility allows for the deposition of a range of different thin film materials such as oxides, nitrides, metals and polysilicon. Producer SE features a comprehensive set of diagnostics and non-contact temperature measurements that provide precise temperature profile data to facilitate accurate process control. It utilizes an advanced process control system that integrates all of the process parameters into one easy to use suite of tools. This allows for dynamic parameter adjustment and optimization of the process conditions without the need to modify the program. Additionally, the built-in diagnostics provide real-time feedback on the process conditions and efficiency of the process. AMAT / APPLIED MATERIALS Producer SE is designed for reliability and repeatability over long term operation. Its modular design allows for easy maintenance and upgrade capabilities, enabling upgrades to be made to enhance productivity and process control. The system is also highly energy efficient, with a low-pressure operation design for reduced CO2 emissions, making it a more sustainable choice for semiconductor device production. Overall, AMAT Producer SE is a reliable and versatile tool for PECVD deposition. It features a dual-chamber design and multiple gas flows for accurate chemistry control, allowing for accurate deposition of a variety of thin film materials. It also features a comprehensive set of diagnostics and process control system for precise temperature profile and process control. It is designed for energy efficiency and sustainability, as well as reliability over long term use.
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