Used AMAT / APPLIED MATERIALS Producer SE #9215461 for sale
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ID: 9215461
Wafer Size: 12"
Vintage: 2006
CVD System, 12"
FI Robot: KAWASAKI (Vacuum EV missing)
Chamber A: Nano cure (UV Cure)
Chamber B: BD (BlackNN diamond)
Chamber C: Blok (Barrier low-k)
Gas: IGS Type
UV Power supply rack: ASTEX Generator
Chamber A:
Gas / Model / Flow
Ar / UFC-8565 / 30slm
He / UFC-8565 / 30slm
Chamber B:
Gas / Model / Flow
O2 / UFC-8565 / 2slm
O2 / UFC-8565 / 500sccm
He / UFC-8565 / 5slm
TMS / UFC-8565 / 750cc
He / UFC-8565 / 5SLM
He / UFC-8565 / 12slm
NF3 / UFC-8565 / 3slm
Ar / UFC-8565 / 3slm
He / UFC-8565 / 5slm
He / UFC-8565 / 10slm
Chamber C:
Gas / Model / Flow
O2 / UFC-8565 / 3slm
O2 / UFC-8565 / 500sccm
He / UFC-8565 / 5slm
O2 / UFC-8565 / 10slm
He / UFC-8565 /12slm
NF3 / UFC-8565 / 3slm
Ar / UFC-8565 / 3slm
He / UFC-8565 / 5slm
He / UFC-8565 / 5slm
Missing gas for chamber B & C:
mDEOS
ATRP
Missing parts:
PC
Flex
Controller unit
MF Motion controller CPU board
LFC (mDEOSx2, ATRTx2)
Chamber B&C:
Heater power filter
Chamber IO controller unit
Lid assy
2006 vintage.
AMAT / APPLIED MATERIALS Producer SE is a next-generation atomic layer deposition system designed for high-throughput production and cost savings. It features a unique modular architecture, a high-absorbance process chamber, and control algorithms to increase wafer uniformity. This allows for faster throughput and greater cost savings without compromising quality. AMAT Producer SE's modular architecture makes it a cost-effective solution for wafer thickness uniformity. It offers the flexibility of being customized to meet the needs of any production volume requirements. Its unique multi-zone design allows for parallel reactor control and greater flexibility in process parameters to increase throughput. Additionally, complex reactor power profiles can be configured for three-dimensional uniformity enhancement. APPLIED MATERIALS Producer SE's high-absorbance process chamber helps to minimize distortion during wafer uniformity testing. It is capable of uniform deposition of nitride, oxides, and other materials across the wafer. The system also features an onboard computer controller for easy programming and control. This enhances reliability and reproducibility, and allows for rapid switching between operating parameters. Producer SE also comes with an advanced control algorithm to ensure wafer thickness uniformity. This includes a multi-zone confocal reflectivity system that allows for finely detailed control over deposition material characteristics. It also can be used for post-deposition processing, such as stress management and sidewall profile control. This helps to ensure uniformity across the wafer. AMAT / APPLIED MATERIALS Producer SE is ideally suited for high-throughput production and cost savings. Its modular architecture, high-absorbance process chamber, and reliable control algorithms make it a cost effective and reliable choice for producing superior quality films. It is an ideal choice for high-volume production runs and can help to reduce total cost of ownership.
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