Used AMAT / APPLIED MATERIALS Producer SE #9215469 for sale
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ID: 9215469
Wafer Size: 12"
Vintage: 2003
CVD System, 12"
Process: SA-USG
(2) Twins
FI Robot: KAWASAKI
Chamber configuration: Chamber-A,B
RPS: MKS ASTRONex FI80131
Heater: ALN
MKS AX8407A Ozone generator
Gas delivery
Chamber A,B:
Gas / Size / Model
O2 / 30slm / Unit 8526C
N2 / 50slm / Unit 8565C
He / 30slm / Unit 8565C
NF3 / 7slm / Unit 8565C
Ar / 15slm / Unit 8565C
TEOS / 7g/min / STEC LF-A40M-A-EVD
Missing parts:
Noise filter
RPSC Line
Lid cover
HDD
Floppy
H/E
Chiller
OTF
iPump
INTLK PCB
Lid hinge
Heater lift assy
Gas: N2
2003 vintage.
AMAT / APPLIED MATERIALS Producer SE is a semiconductor reactor designed to enable customers to achieve thinner full wafers and uniform film deposition. The reactor is ideal for producing super integrated circuits and advanced memory devices. The reactor utilizes high levels of process control to ensure reliable and repeatable wafers. The process chamber is built with a stainless steel liner for durability and easy reconfiguration. The chamber also integrates industrial-grade vacuum systems and insulated windows. This insulation helps to reduce energy losses which leads to better process control. The chamber also offers improved wafer loading/unloading and better substrate pre-alignment. The process chamber is equipped with a deactivator to ensure optimal cleaning between different wafer runs. The tool features an advanced dual zone control equipment with a rotating deactivation system and a static deactivation unit. This machine enables superior process recipes which can be tuned to achieve maximum yield and performance. The reactor is equipped with an isolated zone to reduce the risk of contamination from wafer-to-wafer processes. It features an advanced in-situ plasma generator with a highly configurable control architecture. This in-situ plasma functionality increases process yields by decreasing the amount of variables associated with wafer cleaning. The hot wall design of the reactor achieves high temperatures with low thermal gradients. It delivers precise temperature control on small substrates and generates superior thermal uniformity on large substrates. The hot wall also enables better efficiency of energy use. The vacuum tool used on AMAT Producer SE reactor ensures that wafers are processed under precise vacuum conditions. The vacuum asset uses a combination of turbo pumps, a rotary vane pump, and a mechanical booster pump. The combination ensures high levels of process stability and repeatability. The reactor is equipped with an advanced remote monitoring model that provides real-time diagnostics and data access. It also provides detailed process logs to simplify operations and maintain equipment performance. The remote monitoring equipment also enables improved troubleshooting and process optimizations.
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