Used AMAT / APPLIED MATERIALS Producer SE #9251465 for sale

AMAT / APPLIED MATERIALS Producer SE
ID: 9251465
Wafer Size: 12"
Vintage: 2008
CVD System, 12" 2008 vintage.
AMAT / APPLIED MATERIALS Producer SE is an automated chemical vapor deposition (CVD) reactor which is unique due to its integrated and advanced process control features. AMAT Producer SE provides an optimal solution for the deposition of both low and high-k materials as well as for the synthesis of compound semiconductor alloys such as GaAs and InGaAs. The reactor design enables reliable and uniform deposition over a wide range of deposition parameters and offers an ultra-compact footprint for tight integration in customer manufacturing systems. The reactor consists of a deposition chamber with four separate power supplies for heating, cooling, and crucible inputs and a backside susceptor. The chamber is designed to reach a maximum operating temperature of 1200°C and to maintain a base vacuum down to 10-7 mbar with a mechanical turbo-molecular pump. The regulated gaseous reactant flows are precisely delivered to the deposition chamber through a gas distribution system from integrated input sources. The crucible is made from tungsten and molybdenum and is able to achieve temperatures up to 2000°C. The backside susceptor is made from graphite and also includes a heater plate to enable balanced heating of the solid reactant. APPLIED MATERIALS Producer SE includes several unique features to improve process stability, uniformity, and reliability. For instance, the producer includes a temperature-controlled susceptor that can automatically adjust pressure and flow rates to enable greater processwindow stability. The reactor also incorporates a multi-zone heating system that isolates each of the four chambers to avoid cross-contamination between reactants. This multi-zone system also allows greater uniformity in the substrate temperature profile while depositing on larger substrates. Additionally, Producer SE is equipped with integrated cooling to further reduce thermal gradients along the substrate. The reactor is also equipped with advanced safety systems such as an emergency button to stop the process, halocarbon-based flushing, and safety-valve systems to protect operators and the surrounding environment. Additionally, the reactor is capable of storing up to eight recipes to enable rapid cycling of deposition process parameters. The integrated offline controller makes it possible to remotely control the reactor from a single location to avoid manual errors and reduce setup time. Overall, AMAT / APPLIED MATERIALS Producer SE is a robust and reliable automated CVD reactor which can be used for a wide range of deposition processes and enables greater uniformity and process stability. As such, AMAT Producer SE can be used to reliably and rapidly deposit a wide range of materials and alloys in the semiconductor industry.
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