Used AMAT / APPLIED MATERIALS Producer SE #9261421 for sale

AMAT / APPLIED MATERIALS Producer SE is a state-of-the-art chemical vapor deposition (CVD) reactor used to deposit thin and uniform films onto a variety of substrates. It utilizes a process of chemical precursor vaporized by heat and then entering a process chamber to deposit high-quality materials. AMAT Producer SE is equipped with an array of features, allowing users to tailor the equipment to best suit their unique needs. It comes with one or two reactors, which can both be controlled independently. The temperature of the reactors is adjustable from room temperature up to 1200°C, providing flexibility in film applications. With its independently controlled gas control valves, users can easily adjust the pressure of each gas in the chamber, allowing for more precise control of the reaction. In addition, APPLIED MATERIALS Producer SE has a powerful mechanical pumping system which rapidly evacuates the process chamber. This removes residual contamination from the unit, ensuring a clean and quality environment for the deposition process. A two-stage chemical vapor cleaning machine also helps to remove all organic and inorganic contamination from the chamber. Finally, an integrated optical pyrometer provides online monitoring of the temperature during deposition. Producer SE also includes a number of user-friendly features. It comes with an integrated graphical user interface (GUI), allowing for easy data entry, monitoring, and control of the tool. The asset is also compatible with AMAT software applications, allowing users to take full advantage of the reactor. Overall, AMAT / APPLIED MATERIALS Producer SE is a powerful and reliable CVD model that can prove invaluable in research or production operations. It provides users with easy, precise, and reliable control of their reaction environment, as well as automated monitoring and cleaning systems for a high-quality deposition process. The flexibility and user-friendly features of the equipment make it a great choice for thin film deposition applications.